Nano electron device using nanocrystal material as Coulomb island and manufacture method thereof
A technology of nanocrystalline materials and electronic devices, which is applied in the field of microelectronics, can solve the problems of complex manufacturing process, high manufacturing cost, and low operating temperature of devices, and achieve the effects of simplifying the manufacturing process, reducing manufacturing costs, and good compatibility
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[0033] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0034] Such as figure 2 as shown, figure 2 It is a flow chart of a method for making nanoelectronic devices using nanocrystalline materials as Coulomb islands provided by the present invention, the method comprising:
[0035] Step 201: preparing metal nano-electrodes on an insulating substrate by electron beam lithography, metal deposition and lift-off processes;
[0036] Step 202: Using one of sputtering, evaporation, and atomic layer deposition to grow a layer of Si, Ni, Cu, Al, Pt, Au, Ag, W, Ti with a thickness of 1 nm to 3 nm between the nano electrodes , Cr, WTi thin films, and then annealed in nitrogen at a temperature of 600 ° C to 1300 ° C for 10 seconds to 30 seconds to form nanocrystalline materials;
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