Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same

A sample table and drum type technology, applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of small particle size, uniform dispersion of powder particles, large specific surface area, etc., and achieve compactness High, strong adhesion, simple process effect

Inactive Publication Date: 2010-08-18
BEIHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] Due to the small particle size and large specific surface area, powder particles have various physical and chemical properties that bulk materials do not have. Therefore, research on various characteristics and applications of various series of powder particles at home and abroad has achieved Great progress has been made, but the method and application of coating on the surface of powder particles are still being actively explored. One of the difficulties that needs to be solved is the uniform dispersion of powder particles.

Method used

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  • Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same
  • Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same
  • Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same

Examples

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Effect test

Embodiment 1

[0067] Embodiment 1, with magnetron sputtering nickel-silver alloy film on the surface of inorganic hollow microsphere particles (fly ash) as an example, the detailed process steps are as follows:

[0068] (A) Open the vacuum chamber and put the powder particles into the drum 3;

[0069] (B) two sputtering targets of metallic nickel and metallic silver are respectively installed on different sputtering target holders;

[0070] (C) close the vacuum chamber, open the mechanical pump in the vacuum pumping device, and evacuate the vacuum chamber to 2Pa;

[0071] Turn on the molecular pump in the vacuum pumping device, and evacuate the vacuum chamber to 3.0×10 -3 Pa;

[0072] (D) Fill the vacuum chamber with argon gas, control its flow rate with a mass flow meter and keep it at 24 sccm, and keep the working pressure of the vacuum chamber at 0.8Pa during deposition;

[0073] (E) adjusting the output power of the vibration motor 13 up and down is 100W;

[0074] Adjusting the rota...

Embodiment 2

[0084] Embodiment 2, taking the magnetron sputtering nickel plating film on the surface of SiC particles as an embodiment, the detailed process steps are as follows:

[0085] (A) Open the vacuum chamber and put the powder particles into the drum 3;

[0086] (B) metal nickel target material is installed on the sputtering target frame;

[0087] (C) Close the vacuum chamber, turn on the mechanical pump in the vacuum pumping device, and evacuate the vacuum chamber to 3.3 Pa; turn on the molecular pump in the vacuum pumping device, and pump the vacuum chamber to 3.3 × 10 -3 Pa;

[0088] (D) Fill the vacuum chamber with argon gas, control its flow rate with a mass flow meter to maintain 30 sccm, and keep the working pressure of the vacuum chamber at 0.9Pa during deposition;

[0089] (E) adjusting the output power of the vibration motor 13 up and down is 80W;

[0090] Regulate the rotation speed that the circular rotation motor 14 provides to the drum to be 15r / min;

[0091] Adju...

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Abstract

The invention discloses a drum-type sample stage and a method for magnetron sputtering coating on powder particles by using the same, belonging to the technical field of vacuum coating. The drum-type sample stage comprises a drum, a screen, a dual-mode motion mechanism and a vibration mechanism. The screen is connected with the vibration mechanism, the drum is connected with the dual-mode motion mechanism, and a target is arranged at an opening of the drum. In the magnetron sputtering coating process, the method comprises the following steps of: putting powder particles in the drum; adjusting the rotating speed and the vertical vibration power of the drum according to the dispersion of a powder sample; and driving the powder particles to be above the drum by a wing sheet and fall in the screen under the vertical vibration and the weight action of the drum so that the powder in the screen vertically falls under the vibration of an ultrasonic wave, a sputtering flow emitted from the opening of the drum is deposited on the surface of the falling powder, and a film with good evenness, high compactness and strong adhesion can be deposited on the surfaces of the powder particles after a certain time.

Description

technical field [0001] The present invention relates to a sample stage suitable for magnetron sputtering coating, more particularly, it refers to a novel drum type sample table and a magnetron sputtering coating method for powder particles using the drum type sample table. Background technique [0002] Due to the small particle size and large specific surface area, powder particles have various physical and chemical properties that bulk materials do not have. Therefore, research on various characteristics and applications of various series of powder particles at home and abroad has achieved Great progress has been made, but the method and application of coating on the surface of powder particles are still being actively explored. One of the difficulties that needs to be solved is the uniform dispersion of powder particles. [0003] There are many methods for coating the surface of powder particles, such as vacuum evaporation, magnetron sputtering, electroless plating, chemic...

Claims

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Application Information

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IPC IPC(8): C23C14/50C23C14/35
Inventor 沈志刚俞晓正蔡楚江麻树林邢玉山
Owner BEIHANG UNIV
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