Activating solution for chemical plating and non-metallic surface activation method
An activation solution and electroless plating technology, applied in liquid chemical plating, metal material coating process, coating, etc., can solve the problems of poor substrate adhesion, uneven coating thickness, toxic substances, etc., to achieve smooth surface, The effect of uniform coating thickness
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Embodiment 1
[0031] This embodiment is used to illustrate the activation solution for electroless plating and the non-metallic surface activation method provided by the present invention. The raw materials used in the present invention are all commercially available.
[0032] (1) Preparation of activation solution: first dissolve cuprous chloride in 590mL of ethylene glycol, and add hydrochloric acid to accelerate dissolution under ultrasonic conditions; after cuprous chloride is completely dissolved, add ammonium chloride, then add sodium hypophosphite, and finally Add 2,2'-bipyridine, stir until completely dissolved, add water to make the volume to 1L, stir well and store. In the activation solution, the concentration of each component is:
[0033] Cuprous chloride: 0.404mol / L Ethylene glycol: 10.551mol / L
[0034] Hydrochloric acid: 2.093mol / L Sodium hypophosphite: 0.123mol / L
[0035] Ammonium chloride: 0.187mol / L 2,2'-bipyridine: 0.00117mol / L
[0036] (2) Substrate pretreatment: put...
Embodiment 2
[0042] This embodiment is used to illustrate the activation solution for electroless plating and the non-metallic surface activation method provided by the present invention.
[0043] Adopt the method identical with embodiment 1 to carry out surface treatment to PI film, difference is: the concentration of each component in the activation solution is:
[0044] Cuprous chloride: 0.75mol / L Ethylene glycol: 7.56mol / L
[0045] Hydrochloric acid: 2.55mol / L Sodium hypophosphite: 0.25mol / L
[0046] Ammonium chloride: 0.20mol / L 2-aminopyridine: 0.0106mol / L
[0047] After the electroless plating is completed, the surface is washed with deionized water to obtain a plated piece, which is recorded as A2.
Embodiment 3
[0049] This embodiment is used to illustrate the activation solution for electroless plating and the non-metallic surface activation method provided by the present invention.
[0050] Adopt the method identical with embodiment 1 to carry out surface treatment to PI film, difference is: the concentration of each component in the activation solution is:
[0051] Cuprous chloride: 0.29mol / L Ethylene glycol: 7.83mol / L
[0052] Hydrochloric acid: 0.8mol / L Sodium hypophosphite: 0.085mol / L
[0053] Ammonium chloride: 0.280mol / L 2,2'-bipyridine: 0.00160mol / L
[0054] After the electroless plating is completed, wash the surface with deionized water to obtain a plated piece, which is recorded as A3.
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