Direct writing method for in situ reduction metal nano-structure

Abstract

The invention discloses a direct writing method for in situ reduction metal nano-structure, which utilizes the property that the majority of metal ions can undergo reduction reaction under thermal catalysis condition, induces the reduction reaction of the metal ions by using the current joule heat between an STM scanning probe and a substrate to obtain metal atoms which are subjected to in-situ deposition, and directly obtains the nano-structure from the substrate surface. The principle is as follows: when an STM is used for scanning and imaging, the tunnel current between the probe and the sample surface generates current joule heat in the local micro-area of the sample when flowing through the sample, the reduction reaction of the oxidized metal ion thin layer is induced in the presence of reducing agent, and the meal ions are reduced into the metal atoms which are subjected to in-situ deposition on the substrate surface to form the metal nano-structure. The manufacturing precision of the method can reach nano level, the process is simple, the probe does not need to be pre-treated or soaked many times, continuous operation can be performed, no specific requirement is imposed on the operation environment, the size of the nano-structure is adjustable, and a complex nano-structure shape can be manufactured, therefore the method is a novel nano-processing process based on a scanning probe.

Description

technical field [0001] The invention belongs to the field of nanostructure manufacture, and relates to an in-situ reduction metal nanostructure, in particular to a direct writing method for in-situ reduction of the metal nanostructure. Background technique [0002] With the rapid development of nanotechnology, its application has spread across many technical fields such as information, biology, energy, environment, and machinery. In recent years, the feature size of nano-devices has become smaller and smaller, while their functions have become more powerful. The rapid advancement of the nanometer scale to below 50nm also poses new challenges to the nanostructure manufacturing technology. At present, the nano-manufacturing processes and methods of 50nm and below include direct electron beam etching, focused ion beam FIB etching, extreme ultraviolet lithography EUV, nanoimprinting, scanning probe microscope processing and other process methods. However, these existing method...

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However, these existing methods not only can process fewer ty

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