Direct writing method for in situ reduction metal nano-structure

The invention discloses a direct writing method for in situ reduction metal nano-structure, which utilizes the property that the majority of metal ions can undergo reduction reaction under thermal catalysis condition, induces the reduction reaction of the metal ions by using the current joule heat between an STM scanning probe and a substrate to obtain metal atoms which are subjected to in-situ deposition, and directly obtains the nano-structure from the substrate surface. The principle is as follows: when an STM is used for scanning and imaging, the tunnel current between the probe and the sample surface generates current joule heat in the local micro-area of the sample when flowing through the sample, the reduction reaction of the oxidized metal ion thin layer is induced in the presence of reducing agent, and the meal ions are reduced into the metal atoms which are subjected to in-situ deposition on the substrate surface to form the metal nano-structure. The manufacturing precision of the method can reach nano level, the process is simple, the probe does not need to be pre-treated or soaked many times, continuous operation can be performed, no specific requirement is imposed on the operation environment, the size of the nano-structure is adjustable, and a complex nano-structure shape can be manufactured, therefore the method is a novel nano-processing process based on a scanning probe.