Ultra-soft wet process embossing-type polyurethane resin and preparation method and application thereof

A technology of polyurethane resin and wet method, which is applied in the direction of textiles and papermaking, can solve the problems of high production cost, texture limitation, complicated process flow, etc., and achieve the effect of reducing intermolecular force, reducing force, and solving complex process flow

Active Publication Date: 2011-04-13
SHANGHAI HUIDE TECH CO LTD
View PDF2 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

First of all, the invention synthesizes ultra-soft wet-process embossing polyurethane resin, and the wet-process base made of it can adapt to embossing directly on the base, and the extruded lines are full a

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultra-soft wet process embossing-type polyurethane resin and preparation method and application thereof
  • Ultra-soft wet process embossing-type polyurethane resin and preparation method and application thereof
  • Ultra-soft wet process embossing-type polyurethane resin and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] Raw material name Weight (kg)

[0057] Polybutylene adipate adipate diol (number average molecular weight 3000) 550

[0058] Polyhexamethylene adipate-butylene glycol ester diol (number average molecular weight 4000) 1650

[0059] MDI (diphenylmethane-4,4`-diisocyanate) 750.71

[0060] EG (ethylene glycol) 73.88

[0061] 2,2-Dimethyl-1,3-propanediol 126.4

[0062] Antioxidant TPP 5.25

[0063] Catalyst (bismuth carboxylate) 0.055

[0064] DMF (N, N-dimethylformamide) 7352.31

Embodiment 2

[0066] Raw material name Weight (kg)

[0067] Polybutylene adipate diol (number average molecular weight 2000) 300

[0068] Polyhexamethylene adipate-butylene glycol ester diol (number average molecular weight 4000) 1800

[0069] MDI (diphenylmethane-4,4'-diisocyanate) 780.0

[0070] EG (ethylene glycol) 44.64

[0071] 2,2-Dimethyl-1,3-propanediol 137.28

[0072] Antioxidant TPP 5.1

[0073] Catalyst (bismuth carboxylate) 0.053

[0074] DMF (N, N-dimethylformamide) 7144.48

Embodiment 3

[0076] Raw material name Weight (kg)

[0077] Polybutylene adipate diol (number average molecular weight 3000) 500

[0078] Polyhexamethylene adipate-butylene glycol ester diol (number average molecular weight 4000) 1600

[0079] MDI (diphenylmethane-4,4`-diisocyanate) 793.35

[0080] EG (ethylene glycol) 70.27

[0081] 2-methyl-1,3 propanediol 132.6

[0082] Antioxidant TPP (triphenyl phosphite) 5.15

[0083] Catalyst (bismuth carboxylate) 0.053

[0084] DMF (N, N-dimethylformamide) 7224.5

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses ultra-soft wet process embossing-type polyurethane resin and a preparation method and application thereof, in particular to the ultra-soft wet process embossing-type polyurethane resin which adapts to the direct hot pressing and cold pressing process. The ultra-soft wet process embossing-type polyurethane resin is prepared from isocyanate, a polyester polyol mixture, a mixed chain extender prepared by matching a chain extender with a pendant group with an ethylene glycol chain extender and N, N-dimethylformamide as an organic solvent. A block structure containing ethylene glycol chain extension makes the polyurethane resin structure have the characteristics of high stripping strength and good embossing property by combining with the side chain action after the chain extender with the pendant group fully reacts, and therefore, a wet process base manufactured by the invention can adapt to direct embossing on the base, and the embossed grains are full and clear; and the base has soft and elastic hand feeling and approaches the true skin feeling. The invention solves the problems of grain restriction, complicated process flow, higher manufacturing cost and the like of the traditional process.

Description

technical field [0001] The present invention relates to a synthesis method and production process of a wet-process polyurethane resin for synthetic leather, in particular to a preparation method and production process of an ultra-soft wet-process embossed polyurethane resin suitable for direct hot-pressing and cold-pressing processes . Background technique [0002] With the development of synthetic leather technology, today's synthetic leather materials are getting closer to the characteristics of natural leather. How to make synthetic leather feel closer to natural leather and have richer textures to meet the growing needs of consumers has become an issue. research focus in the field. [0003] At present, the embossing of shoe leather, garment leather, luggage leather and other products in the domestic market is mainly done in wet base (Note: DMF solvent and other fillers and additives are added to polyurethane resin to make a mixed solution, and vacuum machine degassing ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C08G18/76C08G18/42C08G18/32C08G18/12D06N3/14
Inventor 钱建中钱洪祥巩倩邹佳娜李善善尹小婷蒋峰黄诚邹文革
Owner SHANGHAI HUIDE TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products