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Method for preparing super-resolution imaging lens with planar zooming magnification

A technology of super-resolution imaging and magnification, applied in the directions of lenses, optics, instruments, etc., can solve the problems of low imaging quality, small effective area of ​​imaging or lithography, difficult to meet practical applications, etc., and achieve simple and efficient processing methods. , easy to achieve effect

Active Publication Date: 2012-08-08
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But its disadvantage is that the object plane and image plane of this type of zoom super-resolution imaging lens are both curved, and it is difficult to combine with the projection lithography system; the effective area of ​​imaging or lithography is small, and the imaging quality is not high, which is difficult to meet Practical needs

Method used

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  • Method for preparing super-resolution imaging lens with planar zooming magnification
  • Method for preparing super-resolution imaging lens with planar zooming magnification
  • Method for preparing super-resolution imaging lens with planar zooming magnification

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Embodiment 1, making, its concrete making process is as follows:

[0027] (1) in such as figure 1 Prepare a circular groove on the flat and clean quartz substrate as shown: figure 2 As shown, the bottom surface of the circular groove is a plane parallel to the substrate surface, the diameter of the upper bottom of the circular groove is 1 micron, the diameter of the lower bottom is 1 micron, and the depth is 0.5 micron.

[0028] (2) if image 3 As shown, a layer of silver film is deposited on the substrate by vapor deposition, and the thickness of the silver film is 15 nanometers.

[0029] (3) if Figure 4 As shown, the method of spin coating is used to coat a layer of PMMA on the substrate, and the PMMA layer will form an arc surface in the groove under the effect of surface tension, and the PMMA is solidified after heating; the thickness of the sol layer in the groove is 15- According to the principle of minimum surface energy, the thickness distribution of the P...

Embodiment 2

[0031] Embodiment 2, making, its concrete making process is as follows:

[0032] (1) Prepare a 100*100 orthogonal array of circular grooves on a flat and clean quartz substrate; the distance between the centers of two adjacent circular grooves in each row or column is 5 microns; each circle The bottom surfaces of the circular grooves are all planes parallel to the surface of the substrate. The diameter of the upper bottom of the circular groove is 1.5 microns, the diameter of the lower bottom is 1.5 microns, and the depth is 0.6 microns.

[0033] (2) A gold film layer is deposited on the substrate by vapor deposition, and the thickness of the gold film layer is 20 nanometers.

[0034] (3) adopt the method for spin coating to coat one deck curable X-sol layer on the substrate, the X-sol layer can form arc surface in the groove under the effect of surface tension, X-sol layer solidifies after ultraviolet light irradiation; The thickness of the X sol layer in the groove is 15-50...

Embodiment 3

[0036] Embodiment 3, making, its concrete making process is as follows:

[0037] (1) Prepare a 10*10 array of square grooves arranged orthogonally on a flat and clean K9 glass substrate; the distance between the centers of two adjacent circular grooves in each row or column is 3 microns; each square The bottom surfaces of the grooves are all planes parallel to the surface of the substrate. The side length of the upper bottom of the square groove is 2 microns, the side length of the lower bottom is 1.5 microns, and the depth is 1 micron.

[0038] (2) Deposit a layer of silver film on the substrate by magnetron sputtering, the thickness of the silver film is 20 nanometers.

[0039] (3) A layer of SOG is coated on the substrate by spin coating, and the SOG layer will form an arc surface in the groove under the action of surface tension. After heating, SOG is converted into SiO 2 and solidified; SiO in the groove 2 The thickness of the layer is 15-50 nm, where according to the p...

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Abstract

The invention provides a method for preparing a super-resolution imaging lens with planar zooming magnification, comprising the following steps: preparing a circular or square or rectangular flat-bottom groove on a substrate; depositing a silver film layer on the substrate, then coating a cured sol layer on the silver film layer, wherein the sol layer can form an arc surface at the position of the groove under the action of surface tension, and the sol layer is cured after being heated or ultraviolet-irradiated; and so forth, depositing the silver film layers alternatively on the substrate, coating and curing the sol layers, obtaining a plurality of arc-surface film layers formed by a plurality of silver film layers and the sol layers in an alternative manner at the groove position till the groove is filled, and then obtaining the super-resolution imaging lens with planar zooming magnification, wherein an object plane and an image plane of the lens are planes respectively. The super-resolution imaging lens with planar zooming magnification can zoom or amplify images in a two-dimensional manner, and can be applied in super-resolution zooming of photoetching or amplification of images. Therefore, the difficulty that the existing super-resolution imaging lens with planar zooming magnification is difficult to manufacture is solved, and the application potential in the imaging and photoetching fields is large.

Description

technical field [0001] The invention relates to a method for preparing a zooming ratio super-resolution imaging lens, in particular to a method for preparing a plane zooming ratio super-resolution imaging lens. technical background [0002] The zoom super-resolution imaging lens has broad application prospects, for example, it can be used in super-resolution imaging, SPP nanolithography and so on. [0003] The preparation method of the super-resolution imaging lens with zooming magnification utilizes the different exposure doses of the photoresist in different regions to make the structural pattern in the exposed region reach the required shape, and then transfer the pattern to the substrate by etching. Can. But its disadvantage is that the object plane and image plane of this type of zoom super-resolution imaging lens are both curved, and it is difficult to combine with the projection lithography system; the effective area of ​​imaging or lithography is small, and the imag...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B3/00G02B1/10
Inventor 刘凯鹏罗先刚王长涛刘玲冯沁赖之安杨欢
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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