Alumina crystalline material and preparation method and application
A crystal material, aluminum oxide technology, applied in the direction of alumina/aluminum hydroxide, aluminate/alumina/aluminum hydroxide purification, etc., can solve the problem of restricting the purity and density of sapphire crystal, and the low performance index of sapphire crystal purity and density , can not meet the special use requirements and other problems at the same time, to achieve high economic and social benefits, and reduce prices
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Embodiment 1
[0016] A kind of aluminum oxide crystal material (molecular formula is AL 2 o 3 ), it is to meet the main materials used to prepare sapphire crystals, and to meet the requirements for use as oxide substrate materials, nitride semiconductor substrates, and large-scale integrated circuit substrates. The alumina crystal material It is an α-type alumina crystal material, its content of aluminum oxide is ≥99.999%, and its density is 3.98g / cm 3 .
[0017] The preparation method of the alumina crystal material described in Example 1 of the present invention is in a clean environment, that is, according to the requirements of the national standard (GB50073-2001) "Code for Design of Clean Workshops", the air cleanliness in the workshop is required to be 100 grades , using vertical and horizontal single-flow flow patterns, the airflow speed is greater than 0.25 m / s and 0.35 m / s respectively; the indoor air parameter requirements are: the temperature is 18-26 ℃, and the relative humidi...
Embodiment 2
[0023] A kind of aluminum oxide crystal material (molecular formula is AL 2 o 3), it is to meet the main materials used to prepare sapphire crystals, and to meet the requirements for use in the fields of materials for special optical components, high-voltage materials, compound semiconductor materials, etc., and its alumina crystal material is α-type oxide Aluminum crystal material with a content of Al2O3 ≥ 99.999% and a density of 3.98g / cm 3 .
[0024] The preparation method of the aluminum oxide crystal material described in Example 2 of the present invention is in a clean environment, that is, according to the requirements of the national standard (GB50073-2001) "Code for Design of Clean Workshops", the air cleanliness in the workshop is required to be 100 grades , using vertical and horizontal single-flow flow patterns, the airflow speed is greater than 0.25 m / s and 0.35 m / s respectively; the indoor air parameter requirements are: the temperature is 18-26 ℃, and the rela...
Embodiment 3
[0030] A kind of aluminum oxide crystal material (molecular formula is AL 2 o 3 ), it is to meet the main materials used to prepare sapphire crystals, and to meet the requirements for use as infrared military devices, missiles, submarines, satellite space technology, high-intensity laser window materials, etc., its alumina crystal material It is an α-type alumina crystal material, its content of aluminum oxide is ≥99.999%, and its density is 3.98g / cm 3 .
[0031] The preparation method of the alumina crystal material described in Example 3 of the present invention is in a clean environment, that is, according to the national standard
[0032] (GB50073-2001) "Code for Design of Clean Factory Buildings", the air cleanliness in the factory building is required to be 100, and the vertical and horizontal single flow patterns are adopted, and the air velocity is greater than 0.25 m / s and 0.35 m / s respectively; indoor air The parameter requirements are: temperature is 18-26°C, rel...
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Abstract
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