Unlock instant, AI-driven research and patent intelligence for your innovation.

Fine grinding fluid for sapphire substrate and preparation method thereof

A technology of sapphire and grinding fluid, applied in the field of sapphire substrate fine grinding grinding fluid and its preparation, can solve the problems of poor uniformity, precipitation, unfavorable grinding, etc., achieve good uniformity, improve wafer flatness, and facilitate grinding Effect

Active Publication Date: 2013-06-26
ZHEJIANG ROSHOW ELECTROMECHANICAL
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Usually diamond grinding liquid is prepared by diamond powder and water, and it needs to be shaken by hand when using, so for diamond grinding liquid, the uniformity is not good, and there is precipitation, which is not conducive to grinding

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] The fine grinding liquid for sapphire substrate consists of diamond powder, water and suspension, the weight ratio of diamond powder, water and suspension is 1:10:1, and the suspension is added to make the particle size distribution of the grinding liquid more uniform. The suspension is composed of ethylene glycol, stearic acid and sodium hydroxide, and the weight ratio of ethylene glycol, stearic acid and sodium hydroxide=2:5:1.

[0012] The preparation method of the lapping liquid for fine grinding of sapphire substrates comprises the following steps: a, weighing raw materials according to the proportioning described in claim 1 and mixing; b, vibrating the liquid obtained in step a with an ultrasonic oscillator for 10 minutes; c, mixing step b The obtained liquid is filtered; d, the liquid obtained in step c is vibrated for 15 minutes with an ultrasonic oscillator. The frequency of the ultrasonic oscillator is 28khz, and the power is 200w.

[0013] The grinding effic...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses fine grinding fluid for a sapphire substrate and a preparation method thereof; the fine grinding fluid comprises diamond powder, water and a suspending liquid, wherein the weight ratio of the diamond powder to the water to the suspending liquid is 1:10:1; the suspending liquid comprises a dispersing agent, a suspending agent and an antirusting agent, wherein the weight ratio of the dispersing agent to the suspending agent to the antirusting agent is 2:5:1; the dispersing agent is macromolecule organic alcohol; the suspending agent is a macromolecule compound; and the antirusting agent is alkali. Due to the adoption of the technical scheme, the obtained fine grinding fluid has good degree of uniformity and is beneficial to grinding so that the roughness of the surface of a machined wafer is greatly improved, turned down edges are reduced, the machining efficiency is greatly increased and the evenness of a wafer is greatly increased.

Description

technical field [0001] The invention relates to a lapping liquid for fine grinding of sapphire substrates and a preparation method thereof. Background technique [0002] Usually, the diamond grinding liquid is prepared with diamond powder and water, and it needs to be shaken by hand during use, so for the diamond grinding liquid, the uniformity is not good, and there is precipitation, which is not conducive to grinding. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a fine-grinding slurry for sapphire substrates and a preparation method thereof. The resulting slurry has good uniformity and is beneficial to grinding. [0004] In order to solve the problems of the technologies described above, the present invention adopts the following technical solutions: the sapphire substrate fine grinding slurry is made up of diamond powder, water and suspension, and the weight ratio=1:10:1 of diamond powder, water and suspens...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08J5/14C09K3/14
Inventor 李鹏
Owner ZHEJIANG ROSHOW ELECTROMECHANICAL