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Iridium tantalum activating oxide having in situ embedded structure and preparation method thereof

A technology of active oxides, iridium and tantalum oxides, applied in the direction of electrodes, electrolytic processes, electrolytic components, etc., to achieve the effect of improving cost performance, improving corrosion resistance, and increasing density

Inactive Publication Date: 2011-10-19
FUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the activity and corrosion resistance of iridium-tantalum oxide-coated titanium anodes under the conditions of sulfuric acid solution electrolysis still need to be greatly improved.

Method used

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  • Iridium tantalum activating oxide having in situ embedded structure and preparation method thereof
  • Iridium tantalum activating oxide having in situ embedded structure and preparation method thereof

Examples

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preparation example Construction

[0024] The concrete steps of described preparation method are:

[0025] 1) Preparation of iridium tantalum oxide active slurry: with H 2 IrCl 6 and TaCl 5 As the source material, each source material was weighed according to the ratio of Ir:Ta molar ratio of 8:2 to 4:6, and dissolved in butanol solution respectively. After each source material was fully dissolved, the two were mixed evenly to obtain the active slurry;

[0026] 2) Sintering preparation of inserts: Extract the active slurry according to 10-30% of the total mass, heat and solidify at 80-120°C, oxidize and sinter in a box furnace at 300-400°C, cool it out of the furnace, and grind it. A nanoscale iridium-tantalum oxide intercalation is obtained.

[0027] 3) Sintering preparation of the target active oxide: mix the iridium-tantalum oxide insert into the remaining active slurry, stir well, heat and solidify at 80-120°C, oxidize and sinter in a box furnace at 500-550°C, After cooling out of the furnace, the irid...

Embodiment 1

[0030] The preparation of the iridium-tantalum active oxide-coated electrode material with 30% intercalation is carried out in the following steps:

[0031] 1) An area of ​​1.5 mm thick is 10 cm 2 Industrial pure titanium TA 2 After washing with 5% washing powder solution, soak in 10% oxalic acid solution for 2 hours, wash with water, and dry.

[0032] 2) Weigh each source material H according to the ratio of Ir:Ta molar ratio 5:5 2 IrCl 6 and TaCl 5 , and respectively dissolved in butanol to form a solution with a molar concentration of 3 mol / L. After the source substances were uniformly dissolved, the two were mixed uniformly to obtain an active slurry.

[0033] 3) Take out 30% of the slurry, evaporate it at 90-95°C, dry and solidify it at 100-110°C, oxidize and sinter it in a box furnace at 390°C for 5-20 minutes, cool it out of the furnace, and grind it to obtain nanoscale Iridium-tantalum oxide inserts around 12 nm.

[0034] 4) Disperse the prepared iridium-tantalum...

Embodiment 2

[0038] The preparation of the iridium-tantalum active oxide-coated electrode material with 10% intercalation is carried out in the following steps:

[0039] 1) An area of ​​2 mm thick is 10 cm 2 Industrial pure titanium TA 2 After washing with 5% washing powder solution, soak in 10% oxalic acid solution for 2 hours, wash with water, and dry.

[0040] 2) Weigh each source material H according to the ratio of Ir:Ta molar ratio 7:3 2 IrCl 6 and TaCl 5 , and respectively dissolved in butanol to form a solution with a molar concentration of 3 mol / L. After the source substances were uniformly dissolved, the two were mixed uniformly to obtain an active slurry.

[0041] 3) The active slurry is extracted according to 10% of the total amount of slurry, evaporated at 90-95°C and dried and solidified at 100-110°C, then oxidized and sintered in a box furnace at 320°C for 5-20 minutes, cooled out of the furnace, and after grinding, it has Iridium-tantalum oxide intercalation with a nan...

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Abstract

The invention relates to an iridium tantalum activating oxide having an in situ embedded structure and a preparation method thereof; the iridium tantalum activating oxide is prepared by using an in situ embedding method so as to obtain the iridium tantalum activating oxide having the in situ embedded structure. The activating material is prepared in the following steps: firstly performing oxidation sintering at the temperature of 300-400 DEG C on extraction part activating sizing material so as to prepare an iridium tantalum oxide insert at the fine nanoscale; dispersing the insert in remaining activating sizing material; after thermal curing at the temperature of 80-120 DEG C, performing oxidation sintering and annealing in a batch-type furnace at the temperature of 500-550 DEG C so as to obtain the iridium tantalum activating oxide having the in situ embedded structure. In the invention, while the electrocatalytic activity of the iridium tantalum activating oxide is obviously improved, the corrosion resisting property of the coating electrode material is obviously improved; moreover, the preparation method has the characteristics of being simple, convenient and fast, high for operability, high for cost performance.

Description

technical field [0001] The invention belongs to the field of electrode materials applied to electrochemistry and energy industry, and more specifically relates to an iridium-tantalum active oxide with an in-situ embedded structure and a preparation method thereof. Background technique [0002] The earliest electrode material used in the electrochemical industry was artificial graphite. After the advent of active oxides in 1967, ruthenium oxides replaced graphite as industrial titanium anodes. Ruthenium-titanium oxide coating is the most representative electrode material for chlorine evolution. Since 1998, it has been found that the iridium oxide coating is suitable as an oxygen evolution electrode material under high corrosion conditions. The iridium-tantalum oxide-coated titanium anode is the most representative electrode for oxygen evolution. However, the activity and corrosion resistance of iridium-tantalum oxide-coated titanium anodes under the conditions of sulfuric ...

Claims

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Application Information

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IPC IPC(8): C25B11/04C25B11/06C25B11/10
Inventor 王欣唐电白少金邵艳群颜琦张腾
Owner FUZHOU UNIV
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