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A optical projection system

A technology of projection optical system and diaphragm, applied in the field of projection optical system, can solve the problems of non-compliance with lithography, the imaging quality cannot meet the technical requirements of printed circuit boards, etc., and achieve the effect of improving imaging quality and long working distance

Inactive Publication Date: 2011-12-14
SHANGHAI INST OF MEASUREMENT & TESTING TECH
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  • Application Information

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Problems solved by technology

The patent provides the design data of the objective lens and the imaging quality, but the imaging quality cannot meet the technical requirements of the projection optical system of the printed circuit board (PCB) lithography equipment, and there are two glued surfaces, which do not meet the requirements of lithography. technical requirements

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  • A optical projection system
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Embodiment Construction

[0022] The projection optical system of the present invention will be further described in detail below.

[0023] The object of the present invention is to provide a projection optical system that can be used in printed circuit board (PCB) laser direct imaging (LDI) lithography equipment, which can not only effectively correct chromatic aberration, but also has a large working distance, excellent imaging quality to meet the requirements of practical exposure applications.

[0024] Generally, the laser direct imaging (LDI) lithography equipment used in the present invention uses a 405nm laser diode as a light source, and the spectral bandwidth of the projection optical system is required to be 405±5nm. The minimum line width of the device is 15um, and the process factor k1 is 1.0, which is relatively easy to achieve, so that the square numerical aperture NA is

[0025] NA = k 1 × λ ...

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Abstract

The invention relates an optical projection system, which is used for imaging an image in an object plane to an image plane. A first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, and an eight lens are successively arranged along an optical axis from an object side to an image side and a diaphragm is arranged between the fourth lens and the fifth lens. Besides, a back focus of a combined lens set including the first lens, the second lens, the third lens, and the fourth lens is in the center of the diaphragm; a front focus of a combined lens set including the fifth lens, the sixth lens, the seventh lens, and the eight lens is in the center of the diaphragm; therefore, a doubly telecentric structure is formed based on the above-mentioned arrangement. According to the optical projection system provided in the invention, if a technology factor is selected, wherein the technology factor is expressed as K1 being equal to 1.0 and is easily realized, a lithography resolution can completely reach 15 microns, so that a technical requirement of LDI lithography equipment of a PCB can be satisfied sufficiently; moreover, an optical material with high transmissivity is selected, so that an exposure requirement with large doses can be met.

Description

technical field [0001] The invention relates to a projection optical system for laser direct imaging (LDI) lithography of a printed circuit board (PCB), and can also be used for a projection optical system for photolithography and semiconductor packaging lithography. Background technique [0002] At present, in the field of printed circuit board (PCB) lithography equipment manufacturing, Israel Orbotech, which adopts laser direct imaging (LDI) lithography technology, occupies the largest market share. At the Japanese exhibition in May 2007, it announced that it had installed about 250 units. equipment, which in January 2008 claimed to have about 350 installed. The minimum line width of Orbotech's lithography equipment has been increased from 50um to 25um, and even to 15um. Other LDI lithography equipment is mainly provided by Japanese companies, such as Pentax, Fuji, and Dainippon Screen. The minimum line width of these lithography equipment has also reached the order of 15...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B13/22G02B27/00G02B1/00G02B3/00
Inventor 王昕歌
Owner SHANGHAI INST OF MEASUREMENT & TESTING TECH