A optical projection system
A technology of projection optical system and diaphragm, applied in the field of projection optical system, can solve the problems of non-compliance with lithography, the imaging quality cannot meet the technical requirements of printed circuit boards, etc., and achieve the effect of improving imaging quality and long working distance
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[0022] The projection optical system of the present invention will be further described in detail below.
[0023] The object of the present invention is to provide a projection optical system that can be used in printed circuit board (PCB) laser direct imaging (LDI) lithography equipment, which can not only effectively correct chromatic aberration, but also has a large working distance, excellent imaging quality to meet the requirements of practical exposure applications.
[0024] Generally, the laser direct imaging (LDI) lithography equipment used in the present invention uses a 405nm laser diode as a light source, and the spectral bandwidth of the projection optical system is required to be 405±5nm. The minimum line width of the device is 15um, and the process factor k1 is 1.0, which is relatively easy to achieve, so that the square numerical aperture NA is
[0025] NA = k 1 × λ ...
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