Method for producing nano fluid pathway with large area and available size base on SU-8 photosensitive resist

Abstract

The invention provides a method for producing nano fluid pathway with large area and available size base on SU-8 photosensitive resist, which comprises the following steps: spin coating the SU-8 photosensitive resist on a surface of a quartz sheet and a surface of glass in advanced, then curing to form a quartz substrate or a glass substrate, copying a structure of an imprint template to a fluid pathway substrate by using a nano imprinting method, depositing silicon dioxide on the fluid pathway substrate according to a certain Theta angle, when the silicon dioxide reach a certain thickness, the sealing of nano fluid pathway can be realized, so that the production for nano fluid pathway with large area and available size base on SU-8 photosensitive resist can be realized. Compared with the silicon and the other component material, the present invention realizes the development of the production materials and reduced cost, the production efficiency can be enhanced, compared with a polymer material, the control of the pathway size can be realized so that the production method is updated.

Description

technical field [0001] The invention relates to a method for manufacturing a nanofluid channel based on SU-8 photoresist, more specifically, a method for manufacturing a nanofluid channel based on SU-8 photoresist with large area and controllable size. Background technique [0002] In recent years, the basic and technical application research related to nanofluidic channels has become an attractive frontier field, which is generally defined as the cross-section of the channel for fluid flow in the size range of hundreds to several nanometers. The fluid transport in it has specific properties, which can change many physicochemical properties that dominate the macroscopic and microscale fluid transport and molecular behavior. The research based on this system not only breaks through some important concepts of traditional theories, but also some in-depth research results have important applications in many fields such as stretching manipulation of DNA molecules, drug release te...

AI Technical Summary

Problems solved by technology

[0003] At present, the commonly used methods for manufacturing nanofluidic channels are mainly electron beam lithography or focused particle beam etching technology to obtain the groove structure of nanochannels, and use sacrificial layer or bonding technology to realize the bonding and sealing of nanochannels. Precise control of the nanochannel size can be achieved, but the processing time of electron beam or focused particle beam is long, the processing area is only on the order of microns, and the processing cost is high

The choice of materials is also limited to silicon and its compounds. The bonding process requires high temperature and high pressure, and the conditions are harsh, which undoubtedly increases the cost and cycle time, which is not conducive to its development in the direction of deviceization.

In recent years, the use of polymer materials for nanoimprinting combined with hot keys and technology to create nanofluidic channels has also appeared, but this method cannot achieve precise control of the size of polymer channels, so it cannot develop in the direction of mass production and deviceization.

Images