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Recovery method of waste chlorsilane in polysilicon produced through modified Simens Method

A technology of Siemens method and recycling method, which is applied in the direction of halosilane and silicon halide compound, can solve the problems of waste of resources and pressure on the environment, and achieve the effects of saving resources, reducing lye, and reducing the amount of waste residue and wastewater

Inactive Publication Date: 2014-06-11
LESHAN LEDIAN TIANWEI SILICON TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This part of harmless treatment of waste chlorosilanes also causes greater environmental pressure and waste of resources

Method used

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  • Recovery method of waste chlorsilane in polysilicon produced through modified Simens Method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] like figure 1 Shown, the step that adopts chlorosilane recovery system to reclaim trichlorosilane is:

[0043] 1) Collect waste chlorosilanes (waste chlorosilanes from the rectification process, waste chlorosilanes from maintenance, chlorosilane condensate in exhaust gas, waste chlorosilanes from the synthesis process silicon tetrachloride washing liquid, etc.) and transport them to The first liquid storage container 2. In order to prevent impurities from agglomerating and blocking the pipeline, the liquid storage tank is equipped with a stirring device 1 . A cooler 9 is installed on the top of the first liquid storage container 2, and the non-condensable gas is detoxified after being cooled. In order to ensure the normal delivery of waste chlorosilanes and to prevent the explosion of air flowing back into the storage tank, the pressure of the first liquid storage container 2 is controlled at 50-150kpa. The impurity content of the waste liquid in the first liquid sto...

Embodiment 2

[0049] like figure 1 Shown, the step that adopts chlorosilane recovery system to reclaim trichlorosilane is:

[0050] 1) Collect waste chlorosilanes (waste chlorosilanes from the rectification process, waste chlorosilanes from overhaul, chlorosilane condensate in exhaust gas, silicon tetrachloride washing liquid from the synthesis process, etc.) pumped to The first liquid storage container 2. In order to prevent impurities from agglomerating and blocking the pipeline, the first liquid storage container 2 is equipped with a stirring device 1 . A cooler 9 is installed on the top of the first liquid storage container 2, and the non-condensable gas is detoxified after being cooled. In order to ensure the normal delivery of waste chlorosilanes and to prevent the explosion of air flowing back into the storage tank, the pressure of the first liquid storage container 2 is controlled at 400-550kpa. The impurity content of the waste liquid in the first liquid storage container 2: the...

Embodiment 3

[0056] like figure 1 Shown, the step that adopts chlorosilane recovery system to reclaim trichlorosilane is:

[0057] 1) Collect waste chlorosilanes (waste chlorosilanes from the rectification process, waste chlorosilanes from maintenance, chlorosilane condensate in exhaust gas, waste chlorosilanes from the synthesis process silicon tetrachloride washing liquid, etc.) and transport them to The first liquid storage container 2. In order to prevent impurities from agglomerating and blocking the pipeline, the first liquid storage container 2 is equipped with a stirring device 1 . A cooler is installed on the top of the storage tank, and the non-condensable gas is harmless treated after being cooled. In order to ensure the normal delivery of waste chlorosilanes and to prevent the explosion of air flowing back into the storage tank, the pressure of the first liquid storage container 2 is controlled at 50-150kpa. The impurity content of the waste liquid in the first liquid storag...

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Abstract

The invention relates to a recovery method of waste chlorsilane in polysilicon production through an improved Simens Method, which belongs to the production field of the polysilicon, and comprises the following steps that: 1) collecting waste chlorsilane to be transported to a liquid storage tank; 2) conveying the waste chlorsilane in the liquid storage tank to an evaporator; 3) heating the evaporator: the evaporator is heated to 30 DEG C to 180 DEG C, so the chlorsilane inside the evaporator is vaporized to produce the chlorsilane steam, and residual liquid in the evaporator is hydrolyzed; 4) enabling the vaporized chlorsilane to be reacted with damp air, and foreign matters are reacted to generate high-boiling residues; and 5) recycling gas: micro solid foreign matters in the gas are eliminated through the gas-solid separation, and the chlorsilane is condensed to recycle. By adopting the method, the foreign matters in the polluted chlorsilane with high content of foreign matters in the production process can be eliminated, so the requirement on the foreign matter content in the chlorsilane raw material in the process that the improved Simens Method is used for producing the polysilicon can be satisfied; and the cost is low, environmental protection can be realized and no additional equipment is required.

Description

technical field [0001] The invention relates to a method for recovering waste chlorosilane in polysilicon production by the improved Siemens process, and belongs to the field of polysilicon production. Background technique [0002] The current production process of trichlorosilane, the raw silicon powder enters the synthesis furnace through the silicon powder feeding system and reacts with hydrogen chloride to generate trichlorosilane, and simultaneously generates silicon tetrachloride, dichlorodihydrosilane, metal chloride, polychloride Silane, hydrogen and other by-products, this mixed gas is called trichlorosilane synthesis gas. When the trichlorosilane synthesis gas comes out of the furnace, it will carry a small amount of silicon powder. After removing part of the silicon powder through a dry dust removal system (such as a bag dust removal system, etc.), it is sent to a wet dust removal system and washed by silicon tetrachloride liquid. The discharged chlorosilane wast...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107
Inventor 张新郭勇王璜尹志兵
Owner LESHAN LEDIAN TIANWEI SILICON TECH CO LTD
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