Exchange apparatus and method for double-workpiece stage based on double-guide rail double-drive step scanning

Abstract

The invention provides an exchange apparatus and method for a double-workpiece stage based on double-guide rail double-drive step scanning, belonging to the technical field of manufacture equipment for semiconductors. The exchange apparatus comprises a base station and workpiece stages located at an prealigning station and an exposure station; four Y-oriented rectilinear motion units and two X-oriented rectilinear motion units are preset on a balancing mass, and three-phase exchanging of the workpiece stages between a prealigning area and an exposure area is finished through butt joint between rectilinear motor stators of the Y-oriented rectilinear motion units and Y-oriented transitional rectilinear motion units; a first Y-oriented rectilinear motor mover 1 is fixedly connected with a first workpiece stage, a fourth Y-oriented rectilinear motor mover 1 is fixedly connected with a second workpiece stage, and the Y-oriented rectilinear motion units and the X-oriented rectilinear motion units form a double-guide rail double-drive structure at the exposure station. According to the invention, during exchanging of the workpiece stages, three phases are employed, which allows exchanging efficiency to be improved; in specific embodiments of the invention, the advantages of small inertia of motion, short time for stabilization, great structural rigidity, centroidal driving at the exposure station and the like are realized.

Description

technical field [0001] The invention belongs to semiconductor manufacturing equipment, and mainly relates to a double-workpiece table exchange device and method based on double guide rails, double drives, stepping and scanning. Background technique [0002] The lithography machine is one of the important ultra-precision system engineering equipment in semiconductor chip manufacturing. As the current mainstream lithography technology, the step-and-scan type puts forward higher requirements for the motion performance of the workpiece table. The main function of the workpiece table is to carry the wafer under the condition of high speed and high acceleration to achieve nanoscale positioning, complete the processes of loading and unloading, pre-alignment, and alignment in the photolithography process, and cooperate with the mask table to complete the exposure action. Worktable technology plays a vital role in improving the resolution, overlay accuracy and productivity of lithogr...

AI Technical Summary

Problems solved by technology

In the patent CN101201555, the conveyor belt and the docking slider are used to complete the stage changing process, the movement rhythm is small, and the operation and maintenance are simple. However, the conveyor belt mechanism and the docking slider are fixed on the abutment, so there will be a large force during the stage changing process On the abutment, it has a great influence on the overall dynamic performance

In the patent CN1485694, the table-changing operation is completed by the docking of the Y-direction linear motor and the linear guide rail. However, due to the excessive gap in the middle of the abutment, a bridging device is introduced, which increases the movement rhythm and increases the time for table-changing. At the same time, the X-direction linear motor magnetically The steel part is fixed on the abutment, and the movement of the moving parts will generate a large reaction force on the abutment when the platform is changed, which in turn affects the dynamic performance of the entire system

In the patent CN101770181, the docking of the replacement unit is used to complete the work of changing the platform, but the guide device is fixed on the abutment. During the movement of changing the platform, the moving parts will generate a large reaction force on the abutment, which in turn affects the dynamic performance of the entire system.

Therefore, the current dual-platform solution needs to be improved.

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