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Ultraviolet-light-assisted thermocuring nanoimprint lithography technology and material

A nano-imprinting and ultraviolet light technology, which is applied in microstructure technology, metal material coating technology, optics, etc., to achieve wide application prospects and the effect of rapid thermal curing imprinting

Active Publication Date: 2014-03-19
WUXI IMPRINT NANO TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, UV-curable nanoimprinting requires at least one of the imprint templates or substrates to be UV-transparent, which limits the application of UV-curable nanoimprint technology to opaque materials.

Method used

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  • Ultraviolet-light-assisted thermocuring nanoimprint lithography technology and material

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Embodiment Construction

[0013] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0014] In the UV-assisted heat-curing nano-imprint method of the present invention, a multifunctional epoxy resin prepolymer is used as a heat-cured nano-imprint adhesive material, and a cationic photoinitiator is used as an initiator for epoxy resin ring-opening polymerization. First, the nanoimprint adhesive material composed of epoxy resin prepolymer and cationic photoinitiator is coated on the substrate, and then it is exposed to ultraviolet light at room temperature. After the exposure is completed, the nanostructured nano The imprinting template is pressed into the imprinting adhesive film, and then heated and cured at a moderate temperature. After the imprinting adhesive material is cured and shaped, the nano-imprinting template is removed, and the nanostructure on the template is replicated on the substrate.

[0015] The nanoimprint ad...

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Abstract

The invention provides an ultraviolet-light-assisted thermocuring nanoimprint lithography technology and material, belonging to the technical field of micro-nanometer processing. A cationic photoinitiator is adopted to replace thermal initiator; based on the characteristics that the cation polymerization rate of an epoxy group is slow under the normal temperature, the conversation rate is only below 10%, and the conversation rate can be improved to 80% at the temperature above 60DEG C, cationic photoinitiator is photolyzed by the ultraviolet light at the normal temperature to generate cations; then the steps of lithography and heating for curing are carried out to realize quick thermocuring nanoimprint lithography; and the problems of high thermocuring nanoimprint lithography temperature and long time are solved and the limitation that the ultraviolet light curing nanoimprint lithography needs a transparent lithography template or substrate material is overcome.

Description

technical field [0001] The invention belongs to the field of micro-nano processing, and in particular relates to an ultraviolet light assisted thermal curing nano-imprinting technology and a nano-imprinting material used in the imprinting process. Background technique [0002] Nanoimprint technology (published U.S. patent US6180239) was developed in the mid-1990s by Professor Stephen Y. Chou of the Nanostructure Lab of Princeton University in the United States. The traditional photolithography process is limited by the exposure wavelength and has reached the limit of the preparation of microstructures (~ 30nm), unable to obtain a smaller size, a technology similar to polymer molding was proposed, and it was successfully proved that structural units with a size smaller than 10nm can be obtained on semiconductor silicon wafers through this technology. Nanoimprinting is divided into two types: thermal imprinting and UV curing imprinting. Nanoimprinting materials are based on th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00G03F7/075B81C1/00
Inventor 葛海雄张继宗袁长胜卢明辉陈延峰
Owner WUXI IMPRINT NANO TECH