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Duralumin/silicon carbide extreme ultraviolet multilayer reflector and manufacturing method for the same

A silicon carbide and multi-layer film technology, applied in chemical instruments and methods, glass/slag layered products, coatings, etc., can solve the problems of high cost and large interface roughness of Al-based multi-layer films, and reduce production cost, reduce the difficulty of the production process, and improve the effect of the interface

Inactive Publication Date: 2012-06-27
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] In order to overcome the defects of the above-mentioned existing Al-based multilayer film interface roughness or high cost, the object of the present invention is to provide a duralumin / silicon carbide extreme ultraviolet multilayer film reflector

Method used

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  • Duralumin/silicon carbide extreme ultraviolet multilayer reflector and manufacturing method for the same
  • Duralumin/silicon carbide extreme ultraviolet multilayer reflector and manufacturing method for the same
  • Duralumin/silicon carbide extreme ultraviolet multilayer reflector and manufacturing method for the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] First, clean the base optical glass, including the following steps: ultrasonic cleaning with ultrapure water for 10 minutes, organic cleaning liquid white cat detergent ultrasonic cleaning for 10 minutes, ultrapure water ultrasonic cleaning for 5 minutes, and MOS grade acetone ultrasonic cleaning for 10 minutes , ultrapure water ultrasonic cleaning for 10 minutes, ultrasonic cleaning of MOS grade ethanol and ether mixture for 10 minutes, the volume ratio of ethanol and ether is 1:1, and dry with pure nitrogen gas. The base roughness is: 0 nanometer<base roughness<1 nanometer.

[0034] Then plate a duralumin / silicon carbide periodic multilayer film on the substrate optical glass, using the magnetron sputtering method, including the following steps: the working mode of the sputtering target gun is constant power sputtering, and the sputtering working pressure is 1 millitorr ;Before coating the multi-layer film, the background vacuum of the sputtering chamber is 5E-5 Pasca...

Embodiment 2

[0038] First, clean the base optical glass, including the following steps: ultrasonic cleaning with ultrapure water for 10 minutes, organic cleaning liquid white cat detergent ultrasonic cleaning for 10 minutes, ultrapure water ultrasonic cleaning for 5 minutes, and MOS grade acetone ultrasonic cleaning for 10 minutes , ultrapure water ultrasonic cleaning for 10 minutes, ultrasonic cleaning of MOS grade ethanol and ether mixture for 10 minutes, the volume ratio of ethanol and ether is 1:1, and dry with pure nitrogen gas. The base roughness is: 0 nanometer<base roughness<1 nanometer.

[0039] Then plate a duralumin / silicon carbide periodic multilayer film on the substrate optical glass, using the magnetron sputtering method, including the following steps: the working mode of the sputtering target gun is constant power sputtering, and the sputtering working pressure is 1 millitorr ;Before coating the multi-layer film, the background vacuum of the sputtering chamber is 5E-5 Pasca...

Embodiment 3

[0042] First, clean the base optical glass, including the following steps: ultrasonic cleaning with ultrapure water for 10 minutes, organic cleaning liquid white cat detergent ultrasonic cleaning for 10 minutes, ultrapure water ultrasonic cleaning for 5 minutes, and MOS grade acetone ultrasonic cleaning for 10 minutes , ultrapure water ultrasonic cleaning for 10 minutes, ultrasonic cleaning of MOS grade ethanol and ether mixture for 10 minutes, the volume ratio of ethanol and ether is 1:1, and dry with pure nitrogen gas. The base roughness is: 0 nanometer<base roughness<1 nanometer.

[0043] Then plate a duralumin / silicon carbide periodic multilayer film on the substrate optical glass, using the magnetron sputtering method, including the following steps: the working mode of the sputtering target gun is constant power sputtering, and the sputtering working pressure is 1 millitorr ;Before coating the multi-layer film, the background vacuum of the sputtering chamber is 5E-5 Pasca...

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Abstract

The invention belongs to the technical field of precision optical component manufacturing, and discloses a duralumin / silicon carbide extreme ultraviolet multilayer reflector and a manufacturing method for the same. The reflector of the invention comprises a substrate (1) and a duralumin / silicon carbide periodic multilayer film (2), wherein duralumin thin film layers (3) and silicon carbide thin film layers (4) are alternatively deposited on the surface of the substrate (1). The reflector manufacturing method of the invention comprises the following steps of: firstly, washing the substrate (1), and then, plating the duralumin / silicon carbide periodic multilayer film (2) on the substrate (1). The reflector of the invention overcomes the defects, such as larger interface roughness and higher mutual penetration between film layer materials, of the conventional aluminum / silicon carbide multilayer film, reduces the difficulty in the manufacturing technology and reduces the price of metal materials by 2 orders of magnitude; and the novel duralumin / silicon carbide extreme ultraviolet multilayer reflector has the advantages of good film-forming quality, easy manufacturing process, cheap price, excellent optical performance meeting the needs, and the like, thereby being more suitable for realizing industrialization of such products.

Description

technical field [0001] The invention belongs to the technical field of manufacturing precision optical elements, and relates to a duralumin / silicon carbide extreme ultraviolet multilayer film reflector and a preparation method thereof. Background technique [0002] In the extreme ultraviolet (EUV) band, reflective optical elements based on nanometer-thick multilayer films have been widely used in scientific research and engineering technology. Especially in the field of solar physics research, due to the high reflectivity and certain spectral width of the multilayer film, it can be used to build a high-resolution astronomical telescope, so as to realize the single-energy imaging of the sun, and obtain good research results, display a wider application prospect. The selection of coating materials for extreme ultraviolet multilayer mirrors is the focus of developing multilayer mirrors. After decades of research, some very good coating materials have been proposed. There are ...

Claims

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Application Information

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IPC IPC(8): G02B5/08G02B1/10B32B9/04B32B17/00C23C14/35C23C14/18C23C14/06
Inventor 张众钟奇王占山
Owner TONGJI UNIV
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