Handling robot system for chemical mechanical polishing

A robot system and chemical machinery technology, applied in the direction of manipulators, program-controlled manipulators, grinding machine tools, etc., can solve the problems of less research on precision automatic transmission systems, gaps in stability, reliability, and automation, and backwardness, etc., to reduce calculations Affordable, processing-powerful, well-connected effects

Active Publication Date: 2012-07-18
TSINGHUA UNIV
View PDF6 Cites 39 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, compared with foreign countries, the research and development of domestic transfer robots is relatively backward, and there are few studies on precision automatic transfer systems.
At present, almost all the

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Handling robot system for chemical mechanical polishing
  • Handling robot system for chemical mechanical polishing
  • Handling robot system for chemical mechanical polishing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0046] The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. To simplify the disclosure of the present invention, components and arrangements of specific examples are described below. Of course, they are only examples and are not intended to limit the invention. Furthermore, the present invention may repeat reference numerals and / or letters in different instances. This repetition is for the purpose of simplicity and clarity and does not in itself indicate ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a handling robot system for chemical mechanical polishing, which is characterized in that an actuating mechanism comprises a robot body and a support device, the robot body comprises jaws, jaw turning mechanisms, small arms, large arms and a sleeve, the support device comprises a linear guide slide and a guide screw, a detector is used for detecting operating state parameters of the actuating mechanism to generate detection formation, a control device is used for controlling movement and motional angle of the jaws and comprises an upper computer controller, a master controller, a motion controller, a servo driver, a motor and an encoder, the upper computer controller is used for receiving operational orders input by a user, the encoder is used for detecting corresponding state information of the motor, the master controller is used for generating movement orders for the actuating mechanism, the motion controller is used for calculating motor controlling quantity according to a preset control algorithm, the servo driver is used for calculating corresponding control torques of the motor, and the motor is used for driving the actuating mechanism to move under control of the corresponding control torques.

Description

technical field [0001] The invention relates to the technical field of chemical mechanical polishing, in particular to a chemical mechanical polishing transfer robot system. Background technique [0002] In semiconductor manufacturing equipment, its internal dedicated automatic material handling equipment is a wafer transfer robot. The transfer robot needs to meet the requirements that the transfer speed is synchronized with the rough and finish processing speed, the gripping device does not damage the wafer, does not bring new pollution, and there is no shock and vibration during the transfer. [0003] Due to the requirements of the polishing machine, it is necessary to develop a dedicated transfer robot. Foreign companies and research institutions have achieved fruitful results in the research and development of transmission robots and their key technologies, and formed a complete product system. However, compared with foreign countries, the research and development of d...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B24B37/02B24B37/34B25J9/16
Inventor 路新春赵建伟何永勇周顺沈攀许振杰
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products