Method for preparing nanometer copper-sulfur compounds with controllable morphologies based on chemical vapor deposition method
A chemical vapor deposition, copper-sulfur compound technology, applied in copper sulfide, nanotechnology and other directions to achieve the effect of promoting development
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[0018] The invention discloses a method for preparing a copper-sulfur compound with controllable morphology based on a chemical vapor deposition method, which includes three parts: a reaction precursor sampling method, system pressure control, and system temperature regulation.
[0019] ①Injection of reaction precursors: solid or liquid reaction precursors are placed in a quartz boat, and the position of the quartz boat in the reaction zone can be adjusted arbitrarily; The inlet of the gas, the airflow velocity and the inlet time, etc.
[0020] ②System pressure control: The system pressure can be controlled between low pressure and high pressure. The low pressure is conducive to the cleaning of the reaction system and the timely extraction of the reactants, and the regulation of medium and high pressure is conducive to the regulation of product morphology.
[0021] ③System temperature control: The temperature of the reaction zone and the reaction product can be precisely cont...
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