Preparation method of complex CVD (chemical vapor deposition) diamond cutter
A diamond tool and diamond thick film technology, which is applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of CVD diamond tool processing difficulties, low processing efficiency, high processing cost, and the probability of cracks The effect of reducing, high mold utilization rate and reducing production cost
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[0028] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0029] like figure 1 shown.
[0030] A preparation method of a complex CVD diamond thick film cutter, which comprises the following steps:
[0031] Substrate preparation: choose materials that are easy to process and suitable for diamond deposition and growth, such as Si or Mo, as the substrate 1, and control the thickness of the substrate t≥5mm. Both sides of the substrate are ground first, and then deposited on one of the surfaces with a thickness greater than 5 μm Co and Al are materials whose melting point is higher than 1500°C and diamond is not easy to nucleate and grow 2 o 3 Or one of Fe is used as the barrier film 2, and the deposition method of the barrier film 2 can be sputtering, ion plating, chemical vapor deposition, etc.;
[0032] Mold processing: On the side of the substrate 1 with the barrier film 2, a concave mold cavity 3 consi...
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