Alkoxy silane continuous atomizing, neutralizing and purifying method and alkoxy silane continuous atomizing, neutralizing and purifying system
The technology of alkoxysilane and the alkoxysilane is applied in the field of continuous atomization, neutralization, purification and system of alkoxysilane, and can solve the problem of complicated quantification of neutralizer, high nitrogen content of alkoxysilane and high acid value. question
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specific Embodiment approach 1
[0020] Specific embodiment one: in this embodiment, the alkoxysilane continuous atomization neutralization and purification method is carried out according to the following steps: the acidic alkoxysilane containing HCl is atomized with ammonia gas in the atomization and in the chamber, In the purification tower, it is atomized with high-pressure hydrogen gas (the pressure of hydrogen gas is 0.2-1.0MPa), and then neutralized by an organic base, and then treated with a mixed layer of calcium chloride and strong alkali ion resin, and a layer of corrugated plate structured packing. , then condensed and collected; that is, complete the continuous atomization of alkoxysilane and purification; wherein, the mass ratio of calcium chloride and strong base ion resin in the mixed layer of calcium chloride and strong base ion resin is (1~ 100):1.
specific Embodiment approach 2
[0021] Embodiment 2: This embodiment is different from Embodiment 1: the organic base is ethylenediamine, tetramethylenediamine, decylamine, dodecylamine, hexadecylamine or octadecylamine. Others are the same as in the first embodiment.
[0022] The salt formed after the reaction of this type of organic base and hydrogen chloride will form a precipitate, which will not dissolve into the alkoxysilane and introduce impurities. At the same time, neutralize the heat release and the system assists in raising the temperature, so that the solid organic base reaches the melting point and melts. Under reduced pressure, the alkoxysilane atomized at a lower temperature passes through the viscous solid organic base in gaseous form. , through the gas-liquid neutralization reaction, so that the internal hydrogen chloride is completely neutralized, and the product does not contain excess organic alkali; the second layer of filler layer is CaCl 2Mixed layer with strong base ion resin. There...
specific Embodiment approach 3
[0023] Embodiment 3: This embodiment differs from Embodiment 1 or Embodiment 2 in that: the strong base ion resin is an ion exchange resin with quaternary amino bases. Other steps and parameters are the same as those in Embodiment 1 or Embodiment 2.
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