Thyristor with deep energy level doping element drift area
A technology of doping elements and deep-level impurities, which is applied in the field of semiconductor power devices, can solve the problems of slow hole extraction by gate electrode control signal, thyristor turn-off failure, and accelerated gate electrode extraction, so as to reduce high-temperature leakage current and accelerate Turn-off process, effect of improving turn-off characteristics
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[0015] A thyristor with a deep-level doped element drift region, its cell structure is as follows figure 2 As shown, it includes a metallized cathode 1, a polysilicon gate electrode 2, a metallized anode 3, an N+ active region 4, a P-type base region 5, an N-drift region 6, and a P+ anode region 7; the metallized anode 3 is located in the P+ anode region 7, the N-drift region 6 is located above the P+ anode region 7, the P-type base region 5 is located above the N-drift region 6, and the P-type base region 5 is connected to the polysilicon gate electrode 2; the N+ active region 4 is located on the P-type base region Above the region 5, and connected to the metallized cathode 1; the N-drift region 6 is doped with deep-level impurity elements (specific doping elements include: sulfur, selenium, tellurium, gold or platinum).
[0016] It should be further explained that the N-drift region 6 can be fully or partially doped with deep-level impurity elements (that is, the implantati...
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