Transparent conductive thin film
A technology of transparent conductive film and suppression layer, which is applied in the direction of circuits, photovoltaic power generation, electrical components, etc., can solve the problem of increasing the square resistance of OMO conductive film, and achieve the effect of reducing resistance and the relationship between temperature and time
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Embodiment 1
[0033] A kind of transparent conductive film, its cross-sectional schematic diagram is as follows figure 1 As shown, it consists of a substrate 1, a first oxide layer 2, a first suppression layer 3, a metal layer 4, a second suppression layer 5 and a second oxide layer 6 from bottom to top;
[0034] The material of the substrate 1 is glass with a thickness of 1mm;
[0035] The material of the first oxide layer 2 is AZO with a thickness of 14nm;
[0036] The material of the first suppression layer 3 is aluminum (Al) with a thickness of 0.2nm;
[0037] The material of the metal layer 4 is silver (Ag), and the thickness is 12nm;
[0038] The material of the second suppression layer 5 is aluminum (Al) with a thickness of 0.2nm;
[0039] The material of the second oxide layer 6 is AZO with a thickness of 50nm.
[0040] The preparation method of above-mentioned a kind of transparent conductive film, concrete steps are as follows:
[0041] Use cleaned transparent glass, place it i...
Embodiment 2
[0044] A kind of transparent conductive film, its cross-sectional schematic diagram is as follows figure 2 As shown, it consists of a substrate, a first oxide layer, a first suppression layer, a metal layer and a second oxide layer from bottom to top.
[0045] The material of the substrate 1 is glass with a thickness of 1mm;
[0046] The material of the first oxide layer 2 is ZnO, TiO 2 , NiO, Mo 2 o 3 or WO 3 , with a thickness of 12nm;
[0047] The material of the first suppression layer 3 is LiF with a thickness of 0.4nm;
[0048] The material of the metal layer 4 is Ag with a thickness of 12nm;
[0049] The material of the second oxide layer 6 is ZnO, TiO 2 , NiO, Mo 2 o 3 or WO 3 , thickness 30nm.
[0050] The preparation method of above-mentioned a kind of transparent conductive film, concrete steps are as follows:
[0051] Use cleaned transparent glass, place it in the cavity of the magnetron sputtering system, and evacuate it to a vacuum of 10 -5 Torr, fo...
Embodiment 3
[0054] A kind of transparent conductive film, its cross-sectional schematic diagram is as follows image 3 As shown, it consists of a substrate 1 , a first oxide layer 2 , a metal layer 4 , a second suppression layer 5 and a second oxide layer 6 from bottom to top.
[0055] The material of the substrate 1 is glass with a thickness of 1mm;
[0056] The material of the first oxide 2 is AZO with a thickness of 12nm;
[0057] The material of the metal layer 4 is Ag with a thickness of 12nm;
[0058] The material of the second suppression layer 5 is LiF with a thickness of 0.4nm;
[0059] The material of the second oxide layer 6 can be ITO or AZO, with a thickness of 50nm.
[0060] The preparation method of above-mentioned a kind of transparent conductive film, concrete steps are as follows:
[0061] Use clean and transparent glass, put it into the cavity of the magnetron sputtering system, and pump it to a vacuum of 10 -5 Torr, followed by Ar gas, sputtering the first oxide A...
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