Electron bombardment type evaporation source system

Abstract

The invention discloses an electron bombardment type evaporation source system which comprises a crucible mechanism, an electron beam generation mechanism, a scattered electron absorption pole and an ion collector. The crucible mechanism is provided with a plurality of crucibles, the scattered electron absorption pole is arranged above the crucibles, an outlet hole corresponding to the crucibles is arranged at the upper end of the electron beam generation mechanism, and the ion collector is positioned above the electron beam generation mechanism. Electron beams generated by the electron beam generation mechanism deflect by 270 degrees under the action of an electric field and a deflecting magnetic field to be incident into the crucibles so as to form an e-shaped track, and interference of scattered electrons can be effectively prevented. The scattered electron absorption pole is used for absorbing stimulated harmful scattered electrons, and the ion collector is used for absorbing ionized positive ions, so that a film layer and a substrate are effectively protected. The electron bombardment type evaporation source system is long in feeding period and beneficial to large-scale production by the aid of the crucibles, and is simple in structure, simple and convenient to operate and high in automation degree.

Description

technical field [0001] The invention relates to the technical field of evaporation coating, in particular to an electron bombardment evaporation source system of a coating machine used for coating organic light-emitting diodes and solar panels. Background technique [0002] In the production process of Organic Light-Emitting Diode (OLED) and solar panels, many structural layers are formed by vacuum coating process. Therefore, the quality of vacuum coating directly affects the product quality of OLEDs and solar panels. , the following is an introduction with OLED as the background: [0003] Vacuum coating technology is an indispensable technology for the formation of many OLED film layers, especially vacuum evaporation coating technology. The so-called vacuum evaporation coating means that in the vacuum chamber, the evaporating substances such as metals and compounds are placed in the crucible or hung on the hot wire as the evaporation source, and the workpieces to be plated...

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Problems solved by technology

In the production process of OLED, the electron beam heating source is commonly used, which is mainly composed of a hot cathode for providing electrons, an accelerating electrode for accelerating electrons, and an anode. The electrons emitted by the hot cathode are deflected under the action of electric field and magnetic field. The evaporation material is bombarded to evaporate, and the evaporated material is then evaporated onto the glass substrate; the electron beam heating source is characterized by high energy concentration, which can make the local surface of the film obtain extremely high temperature (up to 3000-6000 ℃, Energy density is 10 4 ~10 9 W / cm 2 ), through the adjustment of electrical parameters, the temperature can be accurately controlled and the adjustable temperature range is large, and there is no need to directly heat the crucible, and it can be cooled by water, which avoids the pollution of the crucible material to the film layer; but in the electron beam evaporation source In the process, most compound materials will emit many harmful discrete electrons when they are bombarded by electrons, and the residual gas molecules and membrane material vapor will be partially ionized by electrons, which will affect the quality of the membrane layer.

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