Solar cell having back surface field structures and manufacturing method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- MOTECH INDUSTRIES
- Publication Date
- 2015-01-14
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to a solar cell and a manufacturing method thereof, in particular to a solar cell with a back electric field structure and a manufacturing method thereof. Background technique
[0002] refer to figure 1 , is a schematic diagram of the manufacturing process of a known solar cell 1, and the structure of the solar cell 1 is first described here (please refer to figure 1 The last figure of ) mainly includes: a wafer 11 , a dielectric layer 12 , a plurality of local back surface field structures 13 (local back surface field, LBSF for short) formed on local parts of the wafer 11 , and a metal glue layer 14 .
[0003] Wherein, the wafer 11 is used to convert light energy into electrical energy, and includes a p-type silicon substrate, an n-type emitter layer formed on the substrate, and film layers such as an anti-reflection film. The dielectric layer 12 is formed on the back surface 111 of the wafer 11 to reduce the rate of carrier re...