Preparation method of visible light full-waveband multilayer antireflection coating
An anti-reflection coating and coating technology, applied in coatings and other directions, can solve the problems of high reflectivity, high transmittance, unsatisfactory light transmittance, and limited use of substrates
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[0047] Example 1
[0048] This embodiment is used to illustrate the preparation method of the multilayer anti-reflection coating of the present invention and its adhesion detection.
[0049] To 99.9 g of propylene glycol methyl ether acetate, 0.1 g of methacryloxysilane-modified silica nanoparticles (with a particle size of 13 nm) were added and stirred at 500 rpm to obtain a uniform slurry. Use an ultrasonic cell pulverizer to ultrasonically disperse the above-mentioned slurry for 1 hour, with an ultrasonic power of 1200W, to obtain gas phase SiO 2 Nano dispersion.
[0050] Under the condition of a water bath temperature of 50°C, 20.8 g of ethyl orthosilicate was added to 9.2 g of absolute ethanol, and stirred at 500 rpm for 2 hours. Then add 20ml ammonia water (1N) and stir for 4h to obtain a uniform and stable sol. After standing for 18h, get sol-gel method SiO 2 Nano dispersion.
[0051] 0.8 g of photoinitiator Irgacure 184 (Ciba) was added to 20 g of trimethylolpropane triacry...
Example Embodiment
[0054] Example 2
[0055] This embodiment is used to illustrate the preparation method of the multilayer anti-reflection coating of the present invention.
[0056] To 99.88 g of absolute ethanol, 0.01 g of trimethylolpropane triacrylate was added, and the mixture was stirred at 500 rpm. Then add 0.1g unmodified SiO 2 The nanoparticles were stirred at 500 rpm to obtain a uniform slurry. An ultrasonic cell pulverizer was used to ultrasonically disperse the slurry for 1 hour, and the ultrasonic power was 1200W. Then, use a planetary ball mill to grind the slurry. The diameter of the grinding ball is 0.5mm, the rotation speed is 500rpm, and the grinding time is 12h to obtain vapor-phase SiO 2 Nano dispersion.
[0057] SiO 2 0.0004g of photoinitiator Irgacurel 84 (Ciba) was added to the nano-dispersion, and stirred at 500 rpm to completely dissolve it.
[0058] Under the condition of a water bath temperature of 50° C., 20.8 g of ethyl orthosilicate, 16 g of absolute ethanol and 7 g of i...
Example Embodiment
[0060] Example 3
[0061] This embodiment is used to illustrate the preparation method of the multilayer anti-reflection coating of the present invention.
[0062] Mix 72 g of absolute ethanol, 24 g of propylene glycol methyl ether acetate, 0.2 g of acrylate DESMOPHENA450BA (Bayer), and 0.1 g of Triton-100 and stir evenly at 500 rpm. Add 3g unmodified SiO 2 The nanoparticles were stirred at 500 rpm to obtain a uniform slurry. According to the same dispersion method as in Example 1, the gas phase method SiO was prepared 2 Nano dispersion.
[0063] SiO 2 The thermal initiator 0.044g DESMODURN3390BA / SN (Bayer) was added to the nano-dispersion liquid, and the mixture was stirred at 500 rpm to completely dissolve it.
[0064] Under the condition of a water bath temperature of 50° C., 20.8 g of tetraethyl orthosilicate was added to 15 g of absolute ethanol and stirred at 500 rpm for 2 hours. Then add 40ml ammonia water (1N) and stir for 4h to obtain a uniform and stable sol. After stand...
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