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Method for removing fingerprints from single crystal silicon wafers in solar cell production

A technology for solar cells and monocrystalline silicon wafers, applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as dirty silicon wafers, residual fingerprints, defects, etc., and achieve product A Increased sheet rate, shortened cashmere-making time, and good cashmere production

Inactive Publication Date: 2012-12-26
JILIN QINGDA NEW ENERGY ELECTRIC POWER
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the different manufacturing process of each manufacturer of the existing monocrystalline silicon wafers and poor control in each production link, finger prints often remain on the monocrystalline silicon wafers, and the monocrystalline silicon wafers cannot be removed by the above-mentioned traditional production process Fingerprints left on the surface, and silicon wafers caused by the above reasons are not clean, which will directly affect the A-quality rate of the product

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] ①. Dosing, add 150 liters of deionized water into the process tank with a volume of 150 liters, heat the water temperature in the process tank and keep it at about 15 degrees; then start the preparation of various chemicals, add HF (electronic grade ) 16 liters, stir evenly with a long stick made of PP material, and obtain a dosing solution for later use.

[0015] ②, cleaning, put the 125*125 monocrystalline silicon wafers into the carrying box, put multiple carrying boxes into the big flower blue one by one as a batch, and require the number of single crystal silicon wafers in each batch to be 300 Finally, put the dahualan containing the monocrystalline silicon wafer into the process tank equipped with the solution in ①, control the soaking time to about 200 seconds, and take out the monocrystalline silicon wafer in the dahualan to complete the cleaning process.

[0016] ③ Under the condition of uninterrupted normal production, 40 batches can be produced continuously a...

Embodiment 2

[0018] ①. Dosing, add 155 liters of deionized water into the process tank with a volume of 170 liters, heat the water temperature in the process tank and keep it at about 20 degrees; then start the preparation of various chemicals, add HF (electronic grade ) 16 liters, stir evenly with a long stick made of PP material, and obtain a dosing solution for later use.

[0019] ②, Cleaning, put the 125*125 monocrystalline silicon wafers into the carrier box, put multiple carrier boxes into the big flower blue in turn as a batch, and require the number of monocrystalline silicon wafers in each batch to be 350 Finally, put the dahualan containing the monocrystalline silicon wafer into the process tank equipped with the solution in ①, control the soaking time to about 250 seconds, and take out the monocrystalline silicon wafer in the dahualan to complete the cleaning process.

[0020] ③ Under the condition of uninterrupted normal production, 45 batches can be produced continuously after...

Embodiment 3

[0022] ①. Dosing, add 160 liters of deionized water into the process tank with a volume of 180 liters, heat the water temperature in the process tank and keep it at about 25 degrees; then start the preparation of various chemicals, add HF (electronic grade ) 16 liters, stir evenly with a long stick made of PP material, and obtain a dosing solution for later use.

[0023] ②, Cleaning, put the 125*125 monocrystalline silicon wafers into the carrier box, put multiple carrier boxes into the big flower blue in turn as a batch, and require the number of monocrystalline silicon wafers in each batch to be 400 Finally, put the dahualan containing the monocrystalline silicon wafer into the process tank equipped with the solution in ①, control the soaking time to about 300 seconds, and take out the monocrystalline silicon wafer in the dahualan to complete the cleaning process.

[0024] ③ Under the condition of uninterrupted normal production, 50 batches can be produced continuously after...

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PUM

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Abstract

The invention relates to a process for washing single crystal silicon wafers in solar cell production, in particular to a method capable of cleanly and effectively washing off fingerprints on the single crystal silicon wafers during transfer. The method comprises the steps as follows: (1) adding 150-160 L of de-ionized water into a process tank with the volume of 150-180 L, increasing the temperature of water in the process tank, and keeping the temperature to be 15-25 DEG C; preparing various chemicals, adding 16 L of HF (Hydrogen Fluoride) (electronic grade), and uniformly stirring with a PP (Propene Polymer) long bar to obtain a prepared solution for use; and (2) placing the single crystal silicon wafers with the sizes of 125*125 into bearing boxes, placing the bearing boxes into a big flower basket to serve as a batch of the single crystal silicon wafers, requiring the number of the single crystal silicon wafers in each batch to be 300-400, placing the big flower basket with the single crystal silicon wafers into the process tank with the prepared solution in the step (1), soaking for about 200-300 s, and taking out the single crystal silicon wafers in the big flower basket, so that the washing process is finished.

Description

technical field [0001] The invention relates to a cleaning process of a single crystal silicon chip in the production process of a solar cell, in particular to a method capable of cleanly and effectively cleaning finger prints on the silicon chip when the single crystal silicon chip is supplied. Background technique [0002] my country attaches great importance to the research and development of solar cells. As early as the Seventh Five-Year Plan period, the research work on amorphous silicon semiconductors has been listed as a major national topic; etc. In October 2003, the National Development and Reform Commission and the Ministry of Science and Technology formulated a solar resource development plan for the next five years. The Development and Reform Commission's "Bright Project" will raise 10 billion yuan to promote the application of solar power generation technology. It is planned that by 2015, the total installed capacity of the national solar power generation system ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18B08B3/08B08B11/00
CPCY02P70/50
Inventor 刘万学张兵刘志坚侯丽艳刘海涛
Owner JILIN QINGDA NEW ENERGY ELECTRIC POWER
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