Method for removing fingerprints from single crystal silicon wafers in solar cell production
A technology for solar cells and monocrystalline silicon wafers, applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as dirty silicon wafers, residual fingerprints, defects, etc., and achieve product A Increased sheet rate, shortened cashmere-making time, and good cashmere production
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Embodiment 1
[0014] ①. Dosing, add 150 liters of deionized water into the process tank with a volume of 150 liters, heat the water temperature in the process tank and keep it at about 15 degrees; then start the preparation of various chemicals, add HF (electronic grade ) 16 liters, stir evenly with a long stick made of PP material, and obtain a dosing solution for later use.
[0015] ②, cleaning, put the 125*125 monocrystalline silicon wafers into the carrying box, put multiple carrying boxes into the big flower blue one by one as a batch, and require the number of single crystal silicon wafers in each batch to be 300 Finally, put the dahualan containing the monocrystalline silicon wafer into the process tank equipped with the solution in ①, control the soaking time to about 200 seconds, and take out the monocrystalline silicon wafer in the dahualan to complete the cleaning process.
[0016] ③ Under the condition of uninterrupted normal production, 40 batches can be produced continuously a...
Embodiment 2
[0018] ①. Dosing, add 155 liters of deionized water into the process tank with a volume of 170 liters, heat the water temperature in the process tank and keep it at about 20 degrees; then start the preparation of various chemicals, add HF (electronic grade ) 16 liters, stir evenly with a long stick made of PP material, and obtain a dosing solution for later use.
[0019] ②, Cleaning, put the 125*125 monocrystalline silicon wafers into the carrier box, put multiple carrier boxes into the big flower blue in turn as a batch, and require the number of monocrystalline silicon wafers in each batch to be 350 Finally, put the dahualan containing the monocrystalline silicon wafer into the process tank equipped with the solution in ①, control the soaking time to about 250 seconds, and take out the monocrystalline silicon wafer in the dahualan to complete the cleaning process.
[0020] ③ Under the condition of uninterrupted normal production, 45 batches can be produced continuously after...
Embodiment 3
[0022] ①. Dosing, add 160 liters of deionized water into the process tank with a volume of 180 liters, heat the water temperature in the process tank and keep it at about 25 degrees; then start the preparation of various chemicals, add HF (electronic grade ) 16 liters, stir evenly with a long stick made of PP material, and obtain a dosing solution for later use.
[0023] ②, Cleaning, put the 125*125 monocrystalline silicon wafers into the carrier box, put multiple carrier boxes into the big flower blue in turn as a batch, and require the number of monocrystalline silicon wafers in each batch to be 400 Finally, put the dahualan containing the monocrystalline silicon wafer into the process tank equipped with the solution in ①, control the soaking time to about 300 seconds, and take out the monocrystalline silicon wafer in the dahualan to complete the cleaning process.
[0024] ③ Under the condition of uninterrupted normal production, 50 batches can be produced continuously after...
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