Diffusing process with low temperature, low surface concentration and high sheet resistance

A diffusion process and low-surface technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of increasing the surface recombination rate and reducing the conversion efficiency of silicon wafers of solar cells, so as to reduce the surface recombination rate and improve the efficiency of the battery. efficiency effect
CN102945797AInactive Publication Date: 2013-02-27TIANWEI NEW ENERGY HLDG
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
TIANWEI NEW ENERGY HLDG
Publication Date
2013-02-27
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a diffusing process with low temperature, low surface concentration and high sheet resistance. The diffusing process with low temperature, low surface concentration and high sheet resistance comprises an entering step, a depositing step, a propelling step and an exiting step. The diffusing process with low temperature, low surface concentration and high sheet resistance is characterized in that the reaction temperatures in the entering and depositing steps are lower than 800 DEG C. Preferably, at least one of the depositing step and the propelling step is carried out by steps according to different temperatures. Furthermore, the depositing step is divided into a first depositing step and a second depositing step. The propelling step comprises a first propelling step and a second propelling step. Preferably, an oxidizing step is further carried out between the entering step and the depositing step. The oxidizing step comprises the step of: introducing oxygen into a reactor. By utilizing the diffusing process with low temperature, low surface concentration and high sheet resistance provided by the invention, the reaction temperatures in the depositing and diffusing steps are reduced compared with the that in the conventional process, so that the surface compositing rate is reduced. Meanwhile, impurities are more beneficially migrated to the impurity absorbing point at the lower diffusing temperature in the diffusing process of polycrystalline silicon, so that the battery efficiency is further improved.
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Description

technical field

[0001] The invention belongs to the field of solar cell manufacturing, and relates to a low-temperature, low-surface-concentration, high-square-resistance diffusion process. Background technique

[0002] A solar cell is a device that directly converts light energy into electrical energy through the photoelectric effect or photochemical effect. Thin-film solar cells based on the photoelectric effect are the mainstream. Sunlight shines on the semiconductor p-n junction, and photons with energy greater than the band gap of silicon form new hole-electron pairs. Under the action of the p-n junction electric field, the photogenerated holes are formed by n The region flows to the p region, and the photogenerated electrons flow from the p region to the n region, and a current is formed after the circuit is turned on.

[0003] At present, the square resistance of typical commercial solar cells is 55~65Ω / sq (the unit is ohm per square), and under the premise of good o...

Claims

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