The application provides a preparation method of a BC battery solving a front side wrap plating problem, a BC battery and a
photovoltaic system, and relates to the technical field of photovoltaic cells. The method comprises the following steps: after
polishing a
silicon wafer, a first tunneling layer and a first poly layer are arranged on one side of the
silicon wafer in sequence, a
boron-doped
passivation layer is arranged on the first poly layer, and a first
laser opening mold is performed to obtain a first
silicon wafer; a second tunneling layer, a second poly layer and a
phosphorus-doped
passivation layer are arranged on an N+ region of the first silicon wafer; a gap region is divided, a second
laser opening mold is performed on the gap region by using a second
laser to obtain a second silicon wafer; the second silicon wafer is subjected to rough
polishing treatment and texturing treatment in sequence to obtain a third silicon wafer; an aluminum
oxide layer is arranged on the surface of the third silicon wafer, and a
silicon oxynitride layer is arranged on the surface of the aluminum
oxide layer. The method can effectively remove the edge wrap plating layer by adding rough
polishing treatment before texturing, so that the edge wrap plating layer can be effectively removed, and a normal textured surface can be prepared.