A low-free nanometer wear-resistant polyurethane formula

A low-free, polyurethane technology, applied in the chemical industry, can solve the problems of high mixed viscosity of PU prepolymer and chain extender, poor processing fluidity, slow curing speed, etc., and achieve short demoulding time, good dynamic performance, fast curing effect

Active Publication Date: 2015-08-26
江苏泰东环保工程有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the defects in the prior art that the mixing viscosity of the conventional PU prepolymer and the chain extender is relatively high, the processing fluidity is not good; the curing speed after gelation is relatively slow, and the demoulding time is long, etc., the present invention provides a Low free nano wear-resistant polyurethane formula

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] First, the TDI with a molar ratio of 6:1 is mixed with PTMG to obtain a low-free PU prepolymer. Among them, 2,4-TDI is a product of Mitsui Takeda Chemical Co., Ltd., and the relative molecular weight of PTMG is 2000. Co., Ltd. products, then preheat 100 parts by weight of low-free PU prepolymer to 60°C, keep it for 20 minutes, and then add 3.36 parts by weight of montmorillonite for degassing. The particle size of montmorillonite is 2.3nm, CEC The value is 0.97mmol / g, then 12 parts by weight of MOCA is heated to 100°C for melting, and vacuum degassing, 3,3,3'-dichloro-4,4'·diaminodiphenylmethane (MOCA) Products from Suzhou Xiangyuan Special Fine Chemical Co., Ltd. were used, and the melted MOCA was added to the above-mentioned degassed low-free PU prepolymer for mixing.

Embodiment 2

[0020] First, the TDI with a molar ratio of 6:1 is mixed with PTMG to obtain a low-free PU prepolymer. Among them, 2,4-TDI is a product of Mitsui Takeda Chemical Co., Ltd., and the relative molecular weight of PTMG is 2000. Co., Ltd. products, then preheat 100 parts by weight of low-free PU prepolymer to 80°C, keep it for 10 minutes, and then add 5.625 parts by weight of montmorillonite for degassing. The particle size of montmorillonite is 2.3nm, CEC The value is 0.97mmol / g, then 12.5 parts by weight of MOCA is heated to 80°C for melting, and vacuum degassing, 3,3,3'-dichloro-4,4' diaminodiphenylmethane (MOCA) Products from Suzhou Xiangyuan Special Fine Chemical Co., Ltd. were used, and the melted MOCA was added to the above-mentioned degassed low-free PU prepolymer for mixing.

Embodiment 3

[0022] First, the TDI with a molar ratio of 6:1 is mixed with PTMG to obtain a low-free PU prepolymer. Among them, 2,4-TDI is a product of Mitsui Takeda Chemical Co., Ltd., and the relative molecular weight of PTMG is 2000. Co., Ltd. product, then preheat the low-free PU prepolymer to 60°C, keep it for 15 minutes, and then add 4 parts by weight of montmorillonite for degassing. The particle size of montmorillonite is 2.3nm, and the CEC value is 0.97mmol / g, then heat 12.3 parts by weight of MOCA to 90°C for melting, and perform vacuum degassing. The product of Xiangyuan Special Fine Chemical Co., Ltd., the melted MOCA is added to the above-mentioned low-free PU prepolymer after degassing and mixed.

[0023] The advantages of the present invention are: 1. Compared with the mixture of conventional PU prepolymer and chain extender, the mixed viscosity of low free PU prepolymer and chain extender is smaller, and the processing fluidity is better, so that the manufactured product ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention brings forward a formula for low free nanometer wear-resistant polyurethane. The formula comprises, by weight, 100 parts of a low free PU performed polymer, 12 to 12.5 parts of MOCA and 3 to 5 parts of montmorillonite. With the formula provided by the invention, polyurethane has a small viscosity after mixing, good fluidity in processing and a small compressive deformation value, and a rebound value of a product is great.

Description

technical field [0001] The invention relates to the field of chemical industry, in particular to a polyurethane formula. Background technique [0002] Polyurethane is the abbreviation of polyurethane, and its English name is polyurethane, which is a kind of polymer material. Polyurethane is an emerging organic polymer material, known as the "fifth largest plastic", and is widely used in many fields of the national economy because of its excellent performance. The product application fields involve light industry, chemical industry, electronics, textile, medical treatment, construction, building materials, automobile, national defense, aerospace, aviation and so on. At present, in the process of producing polyurethane, the mass fraction of free TDI monomers in conventional PU prepolymers is 0.005-0.015. These unreacted TDI monomers are easy to volatilize at the pouring temperature when preparing PU elastomers, causing the working environment Pollution. In addition, when th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C08G18/66C08G18/48C08G18/32C08G18/10C08K3/34
Inventor 宗少华张俊达
Owner 江苏泰东环保工程有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap