Nitrine type high-molecular sensitized high-energy ablator, preparation method thereof and target belt made from ablator
A technology of ablation materials and high-energy materials, which is applied in the direction of attacking equipment and compressed gas generation, can solve the problems of large diffusion angle of splashed products, low energy utilization rate, and increased equipment weight, so as to save the glue brushing process, The effect of reducing the weight of working medium and simplifying the production process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0043] Embodiment 1: preparation
[0044] Prepare ablative material in the following proportions:
[0045] Azide materials 79 parts,
[0046] 8 high-energy materials,
[0047] Additives 13 parts.
[0048] (1) Prepare azide-based materials, high-energy materials and additives according to the above proportions, and dissolve them in solvents respectively to obtain azide-based material solutions, high-energy material solutions and additive solutions;
[0049] Wherein, the azide material: 5 g of GAP was dissolved in 20 ml of ethyl acetate.
[0050] Energetic material: 0.51 g of single-base drug was dissolved in 40 ml of ethyl acetate and allowed to stand for 24 hours.
[0051] Additives: 0.5 ml hexamethylene diisocyanate (HDI) dissolved in 5 ml ethyl acetate, 0.01 ml dibutyltin dilaurate (DBTDL), 0.31 g nanocarbon dissolved in 3 ml ethyl acetate.
[0052] (2) Mix the azide material solution obtained in step (1) with the high-energy material solution, and stir evenly;
[0053...
Embodiment 2
[0061] Embodiment 2: preparation
[0062] Prepare ablative material in the following proportions:
[0063] 38 parts of azide materials,
[0064] High energy materials 51 parts,
[0065] Additives 11 parts.
[0066] (1) Prepare azide-based materials, high-energy materials and additives according to the above proportions, and dissolve them in solvents respectively to obtain azide-based material solutions, high-energy material solutions and additive solutions;
[0067] Among them, the azide material: 2.85 g of GAP was dissolved in 20 ml of ethyl acetate.
[0068] Energetic material: 4 g of single-base drug was dissolved in 100 ml of ethyl acetate and allowed to stand for 24 hours.
[0069] Additives: 0.27 ml hexamethylene diisocyanate (HDI) dissolved in 3 ml ethyl acetate, 0.01 ml dibutyltin dilaurate (DBTDL), 0.375 g nanocarbon dissolved in 5 ml ethyl acetate.
[0070] (2) Mix the azide material solution obtained in step (1) with the high-energy material solution, and stir ...
Embodiment 3
[0079] Embodiment 3: preparation
[0080] Prepare ablative material in the following proportions:
[0081] Azide materials 90 parts,
[0082] 70 parts of high-energy materials,
[0083] Additives 15 parts.
[0084] (1) Prepare azide-based materials, high-energy materials and additives according to the above proportions, and dissolve them in solvents respectively to obtain azide-based material solutions, high-energy material solutions and additive solutions;
[0085] Wherein, the azide material: 9 g of GAP was dissolved in 20 ml of ethyl acetate.
[0086] Energetic material: 7 g of single-base drug was dissolved in 55 ml of ethyl acetate and allowed to stand for 24 hours.
[0087] Additives: 5ml hexamethylene diisocyanate (HDI) dissolved in 5ml ethyl acetate, 0.01ml dibutyltin dilaurate (DBTDL), 5g nanocarbon dissolved in 10ml ethyl acetate, 2g CAB381-0.1, 3g TINUVIN328.
[0088] (2) Mix the azide material solution obtained in step (1) with the high-energy material soluti...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com