Variable doping structure of transmission-type photoelectric cathode material for enhancing thermal stability
A technology of photocathode and thermal stability, applied in the direction of photoemission cathode, main electrode of discharge tube, etc., can solve the problems of doping distribution change, disappearance, reduction of built-in electric field strength, etc., to achieve low acceptor binding energy, improve high temperature Performance, effect of low diffusion coefficient
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[0020] Control attached figure 1 , variable doping GaAs photocathode material with high thermal stability is grown by MOCVD method: the substrate material is GaAs (100) substrate 11 , the structure growth steps are:
[0021] 1. Growth of AlGaAs corrosion barrier layer on the substrate material 12 ;
[0022] 2. Continue to grow GaAs zinc heavily doped layer 13 , GaAs Zn low-doped layer 14 ;
[0023] 3. In the low-doped layer of GaAs zinc 14 on Growth of GaAs Carbon Gradient Doped Layer 15 Form a built-in electric field;
[0024] 4. GaAs carbon gradient doped layer 15 on Grow GaAs Spacers 16 , AlGaAs window layer 17 ;
[0025] The specific steps are divided into:
[0026] 1) GaAs carbon gradient doped layer 15 The doping concentration of the low-doped layer from GaAs to Zn 14 GaAs spacer 16 Gradient increase;
[0027] 2) GaAs zinc low-doped layer 14 The introduction of the carbon distribution ensures that the GaAs Zn heavily doped layer 13 Completely disappe...
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