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A thermal oxidation method for crystalline silicon solar cells

A crystalline silicon solar cell and thermal oxidation technology, applied in the field of solar cells, can solve the problems of unsatisfactory phosphorus atom redistribution effect, poor repair effect of dangling bonds, surface lattice defects, etc.

Active Publication Date: 2020-06-09
HENGDIAN GRP DMEGC MAGNETICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to solve the problems of uneven growth of SiO, poor surface lattice defects and dangling bond repair effect due to the slowdown of SIO growth on the surface of silicon wafer with the passage of oxidation time under the constant temperature and constant pressure state of the thermal oxidation process in the prior art, and the redistribution effect of phosphorus atoms Unsatisfactory, the problem that the conversion efficiency range of the final crystalline silicon cell is small, the present invention provides a thermal oxidation method for crystalline silicon solar cells, the method of the present invention adopts specific Step control can effectively grow a uniform and high-quality SiO passivation film on the surface of crystalline silicon solar cells, so that the lattice defects and dangling bond defects on the surface of the silicon wafer can be well repaired, and the phosphorus on the surface of the silicon wafer can be well repaired. The redistribution of the diffusion curve reduces the ratio of the chemical concentration of phosphorus atoms to the effective concentration of phosphorus atoms, improving the minority carrier lifetime, thereby improving the conversion efficiency of crystalline silicon cells

Method used

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  • A thermal oxidation method for crystalline silicon solar cells
  • A thermal oxidation method for crystalline silicon solar cells
  • A thermal oxidation method for crystalline silicon solar cells

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] The silicon wafers after diffusion and etching cleaning are inserted into the quartz boat, sent into the oxidation furnace, heated to 680°C, and 10slm of nitrogen gas is introduced for 10 minutes, so that the gas pressure in the furnace tube reaches 580mbar;

[0058] Introduce nitrogen and oxygen, the nitrogen inflow rate is 1800sccm, the oxygen inflow rate is 380sccm, the inflow time is 8min, the oxidation furnace temperature is controlled at 680°C, and the furnace body pressure is 580mbar;

[0059] Introduce nitrogen and oxygen, the nitrogen inflow rate is 1300sccm, the oxygen inflow rate is 780sccm, and the inflow time is 13 minutes. The temperature of the oxidation furnace is controlled to 780°C, and the furnace body pressure is 280mbar;

[0060] Introduce nitrogen and oxygen, the nitrogen inflow rate is 800sccm, the oxygen inflow rate is 950sccm, and the inflow time is 18min. The temperature rise of the oxidation furnace is controlled to 880°C, and the furnace body pr...

Embodiment 2

[0065] After diffusion and etching, the silicon wafer is inserted into the quartz boat, sent into the oxidation furnace, heated to 700 ° C, and 10 slm of nitrogen gas is introduced for 10 minutes to make the gas pressure in the furnace tube reach 600 mbar;

[0066] Introduce nitrogen and oxygen, the nitrogen inflow rate is 2000sccm, the oxygen inflow rate is 400sccm, the inflow time is 10min, the oxidation furnace temperature is controlled at 700°C, and the furnace body pressure is 600mbar;

[0067] Introduce nitrogen and oxygen, the nitrogen inflow rate is 1500sccm, the oxygen inflow rate is 800sccm, and the inflow time is 15min. The temperature of the oxidation furnace is controlled to 800°C, and the furnace body pressure is 300mbar;

[0068] Introduce nitrogen and oxygen, the nitrogen inflow rate is 1000 sccm, the oxygen inflow rate is 1000 sccm, and the inflow time is 20 minutes. The temperature of the oxidation furnace is controlled to 900 ° C, and the furnace body pressur...

Embodiment 3

[0073] The silicon wafers after diffusion and etching cleaning are inserted into the quartz boat, sent into the oxidation furnace, heated to 720 ° C, and 10 slm of nitrogen gas is introduced for 10 minutes to make the gas pressure in the furnace tube reach 620 mbar;

[0074] Introduce nitrogen and oxygen, the nitrogen inflow rate is 2200sccm, the oxygen inflow rate is 420sccm, the inflow time is 12min, the oxidation furnace temperature is controlled at 720°C, and the furnace body pressure is 620mbar;

[0075] Introduce nitrogen and oxygen, the amount of nitrogen inflow is 1700sccm, the amount of oxygen inflow is 820sccm, and the inflow time is 18min. The temperature of the oxidation furnace is controlled to 800°C, and the pressure of the furnace body is 320mbar;

[0076] Introduce nitrogen and oxygen, the nitrogen inflow rate is 1200sccm, the oxygen inflow rate is 1050sccm, and the inflow time is 25min. The temperature rise of the oxidation furnace is controlled to 920°C, and t...

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Abstract

The invention relates to the field of solar cells, A thermal oxidation method of crystalline silicon solar cell is disclosed, As to that nitrogen flow rate, oxygen flow rate, Pressure and temperatureare controlled in a specific step-by-step manner, A lay of uniform growth can be effectively grown on that surface of the crystalline silicon solar cell, The high quality SiO passivation film can repair the lattice defects and hanging bond defects on the surface of silicon wafer, redistribute the phosphorus diffusion curve on the surface of silicon wafer, reduce the ratio of phosphorus atom chemical concentration to available phosphorus atom concentration, prolong the minority carrier lifetime, and thus improve the conversion efficiency of silicon wafer.

Description

technical field [0001] The invention relates to the field of solar cells, in particular to a thermal oxidation method for crystalline silicon solar cells. Background technique [0002] With the development of crystalline silicon solar cell technology, good surface passivation has become an essential condition for the preparation of high-efficiency cells. Surface passivation is to reduce the surface activity of the semiconductor and reduce the recombination rate of the surface. The main way is to saturate the dangling bonds on the surface of the semiconductor, reduce the surface activity, increase the cleanliness of the surface, and avoid the formation of impurities due to the introduction of impurities in the surface layer. Recombination center, in order to reduce the surface recombination rate of minority carriers, so that the device works stably. [0003] The measures applicable to the surface passivation of solar cells generally include the following four aspects: surfac...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18
CPCH01L31/18H01L31/1868Y02E10/50Y02P70/50
Inventor 黎剑骑孙涌涛彭兴楼彩霞
Owner HENGDIAN GRP DMEGC MAGNETICS CO LTD
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