A kind of method for preparing Y2O3 ceramic coating by low-pressure plasma spraying technology
A low-pressure plasma, Y2O3 technology, applied in coating, metal material coating process, fusion spraying and other directions, can solve the problems of limited life of parts, large damage to the etching process cavity wall, and process cavity wall coating peeling, etc. Achieve low cost and excellent etching resistance
Active Publication Date: 2015-09-09
SOI MICRO CO LTD
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Problems solved by technology
Entering the 300mm equipment, as the plasma power increases, the plasma damages the etching process cavity wall more and more, making the following problems prone to occur during the etching process: (1) particles; (2) process The cavity wall coating peels off, causing the plasma to directly interact with the aluminum substrate; (3) Al 2 o 3 Component life limited by higher power
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[0023] The technical solution of the present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.
[0024] The present invention adopts low-pressure plasma spraying to prepare black Y 2 o 3 ceramic coating. Low pressure plasma spraying (low pressure plasma spraying) is also called vacuum plasma spraying (vacuum plasma spraying). The filter system controls the vacuum of the chamber, and the process technology of controlling the plasma spraying process outside the chamber.
[0025] Such as figure 1 As shown, the embodiment of the present invention provides a kind of low-pressure plasma spraying technology to prepare Y 2 o 3 The method for ceramic coating specifically comprises the steps:
[0026] (1) Choose Y 2 o 3 Powder, the particle size range is 5-100μm, the powder should have a single cubic phase structure; the original particle size of the powder is 40-60nm, the particle size after secondary granulation is 5-50μ...
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Abstract
The invention relates to the technical field of manufacture of Y203 ceramic coatings, in particular to the method of a low-pressure plasma spraying technical equipment Y203 ceramic coating. The method of the low-pressure plasma spraying technical equipment Y203 ceramic coating comprises the following steps: choosing Y203 powder with purity higher than 99.95%, carrying out pre-processing on base materials to be sprayed, vacuumizing the vacuum spraying chamber of vacuum plasma spraying equipment to be 1 to 10 Pa when plasma spraying starts, inert gases Ar is filled in the vacuum spraying chamber to enable the inner pressure of the vacuum spraying chamber to be 1.3*103 Pa, H2 continues to be filled in the vacuum spraying chamber to enable the pressure of the vacuum spraying chamber to be 103 to 104 Pa, then a spraying operation is carried out, and the Y203 coating is prepared. The Y203 coating is prepared under the condition of low pressure through the method, and the Y203 coating prepared through the method is black and has the advantages of being etching resisting, dirty resisting and low in cost.
Description
technical field [0001] The present invention relates to Y 2 o 3 The technical field of ceramic coating manufacturing, specifically relates to a kind of low-pressure plasma spraying technology to prepare Y 2 o 3 Methods of ceramic coating. Background technique [0002] At present, the low-temperature plasma microfabrication method is the key technology for micro-nano processing of materials. It is the basis of preparation technologies such as microelectronics, optoelectronics, micromechanics, and micro-optics. One of the processes is completed by means of plasma processing, such as plasma film deposition, plasma etching, and plasma deglue. Among them, plasma etching is one of the most critical processes, and it is an irreplaceable process to realize the high-fidelity transfer of micro-patterns in VLSI production from photolithographic templates to silicon wafers. [0003] During the etching process, due to the presence of a large number of highly corrosive active free ra...
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IPC IPC(8): C23C4/12C23C4/10C23C4/11C23C4/134
Inventor 邵花王文东刘邦武夏洋李勇滔
Owner SOI MICRO CO LTD