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25 results about "Multiple bonds" patented technology

Updated March 08, 2017. Definition: A multiple bond is a bond where two or more electron pairs are shared between two atoms. Examples: Double and triple bonds are multiple bonds.

Polyester derived from biomass

The present invention provides a biomass-derived polyester compound useful as a rubber material or an adhesive material, the compound including a multiple bond in the molecule. By synthesizing an ester compound composed of a hydroxycinnamic acid and a fatty acid, and carrying out polycondensation reaction using the ester compound as a monomer, a polyester compound containing cinnamic acid and a ricinoleic acid derivative that are alternately linked to each other can be efficiently obtained. For example, an ester compound of General Formula (1) is produced. (In the formula, the substituents R1 and R2 each represent a hydrogen atom or a methoxy group; the substituent R3 represents an alkyl group or an alkenyl group; and n represents an integer of 10 to 100).
Owner:NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY

Film-forming composition having a multiple bond

A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the composition for forming a resist underlayer film. (In formula (1), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, methyl group, or ethyl group; Q1 represents a divalent organic group; R1 represents a tetravalent organic group; and R2 represents an alkenyl group or alkynyl group having 2-10 carbon atoms.) The film-forming composition contains a solvent and a polymer that has a unit structure given by formula (1).
Owner:NISSAN CHEM CORP

Global mid-plane joint solver

A B-rep processing method for performing a structural simulation of a mechanical part is disclosed. The method includes providing a mid-plane of a B-rep representation of the part. Each mid-plane represents a thin portion. The method includes calculating a bond line corresponding to a respective bond of the respective mid-plane based on a boundary line of the respective mid-plane. The method includes determining one or more groups. Each group contains an end of the bond wire to be connected. One or more groups are determined by identifying connection boundary lines corresponding to the bond lines. The method includes, for each determined set of ends, determining a plurality of junction points. The multi-junction point is a connecting point of the tail end. The method includes connecting the bond wire using the determined multiple bond points. The method includes connecting a mid-plane to a connected bond wire.
Owner:DASSAULT SYSTEMES SA

Sizing agent based on multiple bonding synergistic reinforcement mechanism, and preparation method and application thereof

The present application relates to the technical field of fiber surface treatment, in particular to a sizing agent based on a multiple bonding synergistic enhancement mechanism and a preparation method and application thereof, comprising the following steps: dissolving a polymer containing active hydrogen functional groups in a solvent A under a protective atmosphere, stirring and dissolving to obtain a polymer solution; dropping a compound containing covalent crosslinking active sites into the polymer solution, continuously reacting to obtain a homogeneous modified solution; purifying the homogeneous modified solution to obtain a purified product; dissolving the purified product in a solvent B to obtain the sizing agent. The present application solves the technical problems of low physical adsorption bonding strength and poor fatigue resistance caused by the rigidity of a single chemical bonding interface in the existing aramid fiber surface modification technology.
Owner:DONGHUA UNIV

Electrolyte for secondary battery and secondary battery comprising same

An electrolyte for a secondary battery according to the present disclosure comprises a lithium salt, an organic solvent, a first additive represented by chemical formula 1, and a second additive comprising a nitrogen-carbon multiple-bond compound.
Owner:DONGWHA ELECTROLYTE CO LTD

Resist underlayer film-forming composition

A resist underlayer film-forming composition includes: a polymer; and a solvent, in which the polymer has, in a side chain, one or two or more polymerizable multiple bonds selected from the group consisting of a carbon-carbon double bond, a carbon-carbon triple bond, a carbon-nitrogen double bond, and a carbon-nitrogen triple bond.
Owner:NISSAN CHEM CORP

Protein crosslinks to prevent fibril formation

A method is provided for making a protein blocking assembly that is formed by reversibly linking a therapeutic protein to a crosslinking material. The protein blocking assembly contains a chemical structure, which is formed between the multiple bonds between the protein and the crosslinking material, that prevents the interaction of the protein blocking assembly with a second protein due to steric and / or static interference. Furthermore, administration methodologies of administering the protein blocking assembly to a subject are provided, where the protein is cleaved from the protein blocking assembly during or after administration.
Owner:THE CURATORS OF THE UNIVERSITY OF MISSOURI

Photosensitive composition, resist film, pattern forming method, and electronic device manufacturing method

The present invention addresses the problem of providing a photosensitive composition that enables formation of a pattern with small LCDU. A photosensitive composition according to the present invention is a photosensitive composition that contains a resin A1 covalently bonded to an onium salt-type photoacid generator Z1, or contains a resin A2 and an onium salt-type photoacid generator Z2, wherein cations in the onium salt-type photoacid generator Z1 and the onium salt-type photoacid generator Z2 are cations that undergone a structural change by the action of an acid to generate a carbon-carbon multiple bond, and when the cation before undergoing a structural change by the action of the acid is defined as cation X and the cation after undergoing a structural change by the action of the acid is defined as cation Y, an onium salt composed of the cation Y and an anion in the onium salt-type photoacid generator Z1 or the onium salt-type photoacid generator Z2 generates an acid when irradiated with light having any wavelength within a range of 200 nm to 450 nm.
Owner:FUJIFILM CORP

Curable silicone composition for incorporation and release of actives

A silicone curable composition includes a first organopolysiloxane compound having one or more groups comprising a silicon atom bonded to a hydrogen atom and a second organopolysiloxane compound having one or more groups comprising a carbon-carbon multiple bond. The first organopolysiloxane has a molecular weight of 100,000 g / mol or less and the second organopolysiloxane has a molecular weight of 500,000 g / mol or less. The curable silicone composition includes a hydrosilyation catalyst, one or more organosilicon crosslinkers, and a hydrosilylation inhibitor that retards the addition of the one or more organosilicon crosslinkers to one or more of the organopolysiloxanes when the composition is at room temperature. The curable silicone composition also includes a release additive. The release additive is a surfactant having at least one hydrophillic group and at least one hydrophobic group, a hydrophillic silicone excipient, or a mixture of the surfactant and the hydrophillic silicone excipient.
Owner:WACKER CHEMIE AG

Cover glass

This suppresses outgassing and reduces the degradation of the optical properties of the cover glass. [Solution] The cover glass is provided on the surface of a glass substrate and has a fine uneven structure, and is equipped with an anti-reflective layer made of a cured product of a photocurable resin. The cured product of the photocurable resin is a polymer of a first monomer having a monofunctional (meth)acryloyl group and a second monomer having two or more functional (meth)acryloyl groups. The first monomer has either a cyclic structure consisting only of single bonds, or a cyclic structure consisting of single and multiple bonds, or both. The content of the first monomer relative to the total first and second monomers is 20% by mass or more and 50% by mass or less. The content of the second monomer relative to the total first and second monomers is 50% by mass or more and 80% by mass or less. The content of residual monomers derived from the first monomer contained in the polymer is 0.3% by mass or less.
Owner:DEXERIALS CORP

Amphiphilic conjugate of hyaluronic acid oligomer, micellar composition containing it, method for their preparation and use

The invention relates to an amphiphilic conjugate of a hyaluronic acid oligomer, which is prepared by a condensation reaction of an oxyamine group attached to a non-polar chain with the anomeric end of a polar hyaluronic acid oligosaccharide, and to micellar compositions prepared from the amphiphilic conjugates of hyaluronic acid oligosaccharides. The invention further relates to a method for preparing the amphiphilic conjugate and a method for preparing the micellar composition containing it, optionally with one or more active substances. The micellar composition based on amphiphilic conjugates can be used, for example, in pharmaceutical and cosmetic applications where the transport of less polar active substances in a polar environment is required. Formula (I), where M is hydrogen, sodium or potassium, n is the number of disaccharide units of the hyaluronic acid oligomer in the range of 1 to 4, X is a non-polar linear chain of 16 to 20 carbons with the possible content of multiple bonds, for example hexadecyl, octadecyl or cA-octadec-9-enyl.
Owner:CONTIPRO AS

Process for producing aromatic amino compounds

This invention provides a novel method for manufacturing an aromatic amino compound, which is useful as a manufacturing intermediate for agricultural pharmaceuticals and electronic materials, and has at least one multiple bond selected from carbon-carbon, carbon-nitrogen, and carbon-oxygen in the portion outside the aromatic ring. A method for manufacturing an aromatic amino compound is characterized by catalytic reduction of an aromatic nitro compound having at least one multiple bond selected from carbon-carbon, carbon-nitrogen, and carbon-oxygen in the portion outside the aromatic ring using a Pt / C catalyst in the presence of at least one phosphorus compound (A) selected from the phosphorus compounds shown in formula (1), formula (2), and formula (3). P(R) 1 )3 (1), PO(R) 2 )3 (2), (R 3 )2P-R 4 -P(R) 3 )2 (3) The meanings of the symbols in the above formulas (1) to (3) are as defined in the instruction manual.
Owner:NISSAN CHEM CORP

Sulfur-containing polymer compound and method for producing same, adhesive composition, adhesion method, molded body, and crosslinked polymer compound

PCT designated stageWO2026105664A1AdhesivesPolymer scienceCrosslinked polymers
Provided are a novel sulfur-containing polymer compound having a carbon-carbon double bond site incorporated into a sulfur polymer, and a method for synthesizing the same. Also provided is a sulfur-containing polymer compound having excellent adhesive performance even in a high-temperature state. The present invention is a sulfur-containing polymer compound which has a sulfur site represented by the general formula (1) -(S)n- (1) (in formula (1), n represents a number of 1 or more) and one or more multiple binding sites selected from the group consisting of carbon-carbon double bond sites and carbon-carbon triple bonds.
Owner:OSAKA UNIVERSITY

Carbamate compound

A carbamate compound represented by the following formula (0).wherein l is 0 or 1, m is an integer of 1 to 4, n is an integer of 1 to 4, R1 and R2 are substituents having a “R10—CR2—” structure, R3 is a hydrogen atom or a substituent having a “R10—CR2—” structure, R4 is a substituent selected from a substituent having a “R10—CR2—” structure, a substituent having a “R10—At16—” structure, and a substituent having a “R102—At15—” structure, At15 is a Group 15 atom, At16 is a Group 16 atom, R and R10 are each a group containing an atom selected from carbon, hydrogen, and Groups 15, 16, and 17 elements, which has 0 to 17 carbon atoms and 0 to 4 heteroatoms, R1 to R4 and R may bond to each other to form a monocyclic or polycyclic ring, and R and R10 may bond to each other to form a monocyclic ring, a polycyclic ring, or a multiple bond.
Owner:MITSUI CHEMICALS INC

Diaphragm and preparation method and application thereof

The invention provides a diaphragm and a preparation method and application thereof, the diaphragm comprises a base membrane and a functional coating, and the functional coating is located on the surface of at least one side of the base membrane; the functional coating comprises a modified first polymer and a second polymer; the modified first polymer comprises boric acid ester bonds and hydroxyl groups; the second polymer comprises at least one of polyvinylidene fluoride (PVDF) and a copolymer thereof, polyoxyethylene (PEO), polyurethane and polyvinyl butyral (PVB). According to the diaphragm provided by the invention, through a hydrogen bond and multiple bonding mechanism, rapid repair of microcracks on the surface of the diaphragm can be realized, and the diaphragm has excellent self-healing performance, mechanical stability, thermal stability and electrolyte infiltration performance, so that the electrochemical performance of a battery can be effectively improved.
Owner:JIANGSU ZENIO NEW ENERGY BATTERY TECH CO LTD

Composition for resist underlayer film formation

A composition for forming a resist underlayer film comprises a polymer (A), a compound having polymerizable multiple bonds (B), and a solvent (C).
Owner:NISSAN CHEM CORP

Composition for forming resist underlayer film

The present invention provides a composition for forming a resist underlayer film that is capable of forming a satisfactory resist pattern while improving sensitivity. This composition for forming a resist underlayer film includes: a polymer (A) in which a urethane bond is formed by the reaction of a hydroxyl group in a polymer (C), which has the hydroxyl group and also has one or more polymerizable multiple bonds selected from the group consisting of a carbon-carbon double bond, a carbon-carbon triple bond, a carbon-nitrogen double bond, and a carbon-nitrogen triple bond in a side chain, with an isocyanate group in a compound (B), which has the isocyanate group and a monovalent organic group (B1), and in which the monovalent organic group (B1) is bonded to the polymer (C) via the urethane bond; and a solvent.
Owner:NISSAN CHEM CORP

Curable composition

A curable composition includes a first organopolysiloxane compound having one or more groups including a silicon atom bonded to a hydrogen atom, and a second organopolysiloxane compound having one or more groups including a carbon-carbon multiple bond. The curable composition also includes a hydrosilylation catalyst, an organopolysiloxane resin, a silver-containing antimicrobial agent, and a hydrophilic compound. The composition is an emulsion having a continuous phase and a discontinuous phase. The antimicrobial agent and the hydrophilic compound are present in a discontinuous phase.
Owner:WACKER CHEMIE AG

Hardening components

The curable composition comprises a first organopolysiloxane compound having one or more groups containing silicon atoms bonded to hydrogen atoms, and a second organopolysiloxane compound having one or more groups containing carbon-carbon multiple bonds. The curable composition also comprises a hydrosilylation catalyst, an organopolysiloxane resin, a silver-containing antimicrobial agent, and a hydrophilic compound. The composition is an emulsion having a continuous phase and a discontinuous phase. The silver-containing antimicrobial agent and the hydrophilic compound are present in the discontinuous phase.
Owner:WACKER CHEMIE AG

Non-aqueous electrolyte and secondary battery

The application relates to a nonaqueous electrolyte and a secondary battery, which comprises a solvent, an alkali metal salt, a first additive, and a second additive; the first additive is at least one of substance 1, substance 2 and substance 3; and the second additive is a multiple bond additive. In the second additive of the application, the C connected with the multiple bond can accept the O free radical of the ring opening in the first additive, and a stable organic SEI component is synchronously formed; the SEI simultaneously contains S-O, R-C-Se-O groups or sulfite or sulfate, and a composite film component is formed, wherein the S-O component or the R-C-Se-O component can improve the kinetics and transmission capacity of the SEI, and the long-chain film component of the multiple bond can provide stability.
Owner:REPT BATTERO ENERGY CO LTD +1

Composition for resist underlayer film formation

The present application provides a composition for forming an antireflective underlayer film, which comprises a polymer (A) having a partial structure represented by the following formula (A), a polymer (B) having a polymerizable multiple bond, and a solvent (C). (In the formula (A), R 11 represents a (n+2)-valent group having at least either one of an aromatic hydrocarbon ring and an aliphatic hydrocarbon ring. R 12 represents a hydrogen atom, or represents an alkyl group having 1 to 13 carbon atoms which can be substituted. n represents 1 or 2. When n is 2, two R 12 may be the same or different. R represents a bonding position.
Owner:NISSAN CHEM CORP

Synthesis of β-lactam penicillin antibiotics with peptide structure

PCT designated stageWO2026135631A2Organic chemistryAklanonic acidCarboxylic acid
The invention relates to the synthesis of novel penicillin β-lactam antibiotics with synthetic peptide structures containing C-C and C-N multiple bonds, and the synthesis of their pharmaceutically acceptable salts, via four-component reactions using 6-aminopenicillanic acid (6-APA) as the aldehyde, amine, isonitrile, and carboxylic acid, or 6-aminopenicillanic acid (6-APA) as the aldehyde carboxylic acid and amine.
Owner:T C ERCIYES UNIVERSITESI

Composition for resist underlayer film formation

Provided are a composition for forming a resist underlayer film capable of forming a fine resist pattern with good sensitivity, a resist underlayer film using the composition for forming a resist underlayer film, a layered body, a method for manufacturing a semiconductor element, and a pattern forming method. A composition for forming a resist underlayer film, comprising a polymer (A) having, in a side chain, one or two or more polymerizable multiple bonds selected from the group consisting of carbon-carbon double bonds, carbon-carbon triple bonds, carbon-nitrogen double bonds, and carbon-nitrogen triple bonds, and an aromatic hydrocarbon ring, and a solvent.
Owner:NISSAN CHEM CORP

Free-state lead alkyne compound as well as preparation method and application thereof

The invention provides a free-state lead alkyne compound as well as a preparation method and application thereof. The free-state lead alkyne compound has a structure as shown in a formula I: (I) wherein Ar1, Ar2 or Ar3 are respectively and independently aryl or heteroaryl, and are further optionally and respectively and independently subjected to monosubstitution or polysubstitution by the same or different substituent groups R; the substituent group R is further optionally, independently, monosubstituted or polysubstituted by the same or different substituent group R0. The invention provides a feasible free-state lead alkyne synthesis strategy, stable separation and structural characterization of the compounds are realized, a new research direction is developed for heavy element alkyne chemistry, and theoretical and experimental basis is provided for reaction design and application of a heavy main group element multi-bond system.
Owner:SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY