Gap flow control device of immersion microscope

Abstract

The invention discloses a gap flow control device of an immersion microscope. The gap flow control device is arranged between a lens set and a substrate, an observation chamber is arranged at the center, and liquid supply holes, a recovery chamber, recycling holes, isolation grove arrays and the like are sequentially arranged outwards. The liquid supply holes are uniformly distributed at an annular area at the periphery of the observation chamber, and are connected with the liquid supply chamber through a liquid supply one-way valve, and the recycling holes are connected with an outer recycling chamber through a recycling one-way valve. When the substrate moves, a liquid flow is formed under the action of viscosity of liquid, and the distribution of pressure inside a gap flow is changed; and each one-way valve can self-adapt to adjust the opening so as to obtain a liquid flow dynamically consistent with the movement direction of the substrate, and thus the best liquid update stage is finally realized. The gap flow is mainly driven by a shear flow formed by the movement of the substrate, therefore, the low pressure of liquid and the boundary stability can be effectively kept, and the device is especially suitable for fissures and work conditions of high-speed movement of the substrate.

Description

Technical field: [0001] The invention relates to a slit flow control device in an immersion microscope system, in particular to a slit flow control device for an immersion microscope (Immersion Microscope). Background technique: [0002] In industries such as semiconductors, fault analysis and reliability evaluation of tiny electronic devices are the key to ensuring yield. The usual way is to take the electronic device as a sample and observe it under a microscope to determine whether there are defects or impurities that affect its normal operation. However, as the characteristic line width of electronic devices continues to shrink below 32 nanometers, and the size of substrates (such as semiconductor silicon wafers) continues to increase, the technical cost of traditional observation methods is rising rapidly. [0003] The immersion microscope system fills the thin layer gap between the front end of the objective lens and the substrate (such as silicon wafer or liquid crys...

AI Technical Summary

Problems solved by technology

However, since the liquid does not flow, the pollution on the surface of the substrate and the periphery of the flow field will continue to spread and accumulate in the observation area as the observation progresses, and the quality of the liquid will deteriorate.

This will change the properties of the liquid and cause imaging distortion for micro-nano observations

[0006] 2) With the accumulation of pollution inside the flow field, the continuous deposition of pollutants on the surface of the objective lens will seriously affect the quality of observation

Applying pressurized gas on the periphery of the liquid can suppress the leakage of the liquid, but it increases the disturbance of the boundary (such as gas-liquid two-phase flow), and it is easy to cause problems such as bubble entrainment and damage to the uniformity of the liquid.

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