The invention discloses a gas device based on
shear flow, which comprises a first gas inlet
flange, the first gas inlet
flange is connected with a mixer shell, a second gas inlet pipeline is arranged on the mixer shell in a penetrating manner, and the left end of the mixer shell is connected with a first gas inlet pipeline; the right end of the gas I inlet pipeline is connected with a spherical seal head and is provided with slotted holes which are uniformly distributed along the
pipe diameter, and the slotted holes are positioned right below the outlet of the gas II pipeline; and a semi-elliptical plate is mounted in the mixer shell and is positioned at one end, far away from the gas I inlet
flange, of the gas II inlet pipeline. The gas I tangentially flows at the slotted hole and is subjected to first-stage mixing with the gas II, so that the gas flow close to the
pipe wall layer is changed; according to the
gas mixing device, the first-stage mixing is realized after the gas passes through the semi-elliptical plate, and the second-stage mixing is realized after the gas passes through the semi-elliptical plate, so that the
gas mixing uniformity is improved, the pressure loss of the second
gas pipeline is not increased, the second-stage mixing is realized while the gas flow channel is changed, and the
mixed gas reaches a complete turbulent flow state.