Silicon heat sink and preparation method thereof for high-power semiconductor diode laser packaging
A technology of semiconductors and lasers, which is applied in the field of optoelectronics, can solve the problems of small self-diffusion coefficient, damage to the human body, difficult sintering and compactness, etc., and achieve the effect of good heat dissipation, low cost and high finish
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[0022] See figure 1 with figure 2 As shown, a silicon heat sink for packaging high-power semiconductor lasers includes:
[0023] A silicon wafer 1, the thickness of the silicon wafer 1 is 100um-1000um, and the silicon wafer 1 is double-sided polishing;
[0024] A first silicon dioxide layer 2 fabricated on the front surface of the silicon wafer 1, the thickness of the first silicon dioxide layer 2 is 3000 angstroms-1.5um, and the first silicon dioxide layer 2 is an insulating layer;
[0025] A second silicon dioxide layer 3, fabricated on the back of the silicon wafer 1, the thickness of the second silicon dioxide layer 3 is 3000 angstroms-1.5um, and the second silicon dioxide layer 3 is an insulating layer;
[0026] A first metallization layer 4, which is fabricated on the first silicon dioxide layer 2. The first metallization layer 4 is divided into two sections, with a gap 41 in the middle part;
[0027] A second metallization layer 5 is fabricated on the second silicon dioxide laye...
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