Mask platform system with six-degree-of-freedom coarse drive platform

A technology of coarse motion table and degree of freedom, which is applied in the direction of propulsion system, electric components, electrical program control, etc., can solve the problems of limiting the motion accuracy of the mask table, requiring extremely high assembly accuracy, and hindering the improvement of acceleration, so as to increase flexibility , Improve productivity, avoid vibration and noise effects

Active Publication Date: 2013-07-03
TSINGHUA UNIV +1
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When this laminated drive structure is in motion, the double-sided drive structure of the underlying linear motor with single-degree-of-freedom reciprocating motion is supported by ai

Method used

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  • Mask platform system with six-degree-of-freedom coarse drive platform
  • Mask platform system with six-degree-of-freedom coarse drive platform
  • Mask platform system with six-degree-of-freedom coarse drive platform

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Embodiment Construction

[0026] The specific structure, mechanism and working process of the present invention will be further described below in conjunction with the accompanying drawings.

[0027] The present invention provides a mask stage system with a six-degree-of-freedom coarse motion stage, such as figure 1 and figure 2As shown, the system includes a coarse motion table, a fine motion table and a frame. The coarse motion table includes a coarse motion table body 2, a driving device and two coarse motion table gravity balance components; the coarse motion table body 2 is set on the fine motion table The outer side of the moving table is a thin-walled shell made of sintered silicon carbide ceramic material; the driving device includes two parts: a large-stroke driving module and a small-stroke driving module. The large-stroke driving module is composed of two groups of first X-direction linear motors 3 and second X-direction linear motors 4 that are symmetrically arranged on both sides of the ...

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Abstract

A mask platform system with a six-degree-of-freedom coarse drive platform is mainly used in a photoetching system. The system comprises the coarse drive platform, a fine drive platform and a rack, wherein the coarse drive platform comprises a coarse drive platform body, a drive device and a coarse drive platform gravity balance component, the coarse drive platform body is arranged at the outer part of the fine drive platform to surround the fine drive platform in the middle, and the drive device comprises two groups of X-direction linear motors distributed symmetrically around the direction of an X-axis and four groups of two-degree-of-freedom linear motors driving a Y-direction and a Z-direction to achieve the six-degree-of-freedom motion of the coarse drive platform. The six-degree-of-freedom coarse drive platform and the six-degree-of-freedom fine drive platform are matched, so that the speed, acceleration and control bandwidth of a mask platform are increased and the requirements of high motion precision and location precision are met while the posture of the mask platform is regulated, and furthermore, the production rate, the alignment precision and the resolution ratio of a photoetching machine are improved.

Description

technical field [0001] The invention relates to a photolithography machine mask table system, which is mainly used in semiconductor photolithography machines and belongs to the technical field of semiconductor manufacturing equipment. Background technique [0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is called a photolithography machine (exposure machine). The resolution and exposure efficiency of the lithography machine greatly affect the characteristic line width (resolution) and productivity of the integrated circuit chip. As the key system of the lithography machine, the motion accuracy and work efficiency of the mask table system largely determine the resolution and exposure efficiency of the lithography machine. [0003] The basic principle of the ...

Claims

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Application Information

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IPC IPC(8): G03F7/20H02K41/03G05B19/18
Inventor 张鸣朱煜成荣刘召杨开明刘昊徐登峰田丽张利叶伟楠张金穆海华尹文生胡金春
Owner TSINGHUA UNIV
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