Technology for producing ultra-clean high-purity hydrochloric acid

Abstract

The invention discloses a technology for producing ultra-clean high-purity hydrochloric acid. The technology comprises 1, raw material selection comprising selecting a hydrochloric acid solution having a concentration of 36 to 38% as a raw material, 2, dilution comprising diluting the raw material with deionized water until the concentration is 35%, 3, rectification comprising adding the diluted raw material into an internal heating-type rectification device, feeding cooling water into a hydrochloric acid absorption device, and starting an internal heating device to heat the raw material, 4, absorption comprising after the raw material is heated and evaporated into hydrochloric acid gas and vapor, absorbing the hydrochloric acid gas and the vapor fed into the hydrochloric acid absorption device by pipes to obtain a hydrochloric acid solution, continuously adding the raw material into the rectification device, and simultaneously, opening a reject valve, 5, blending comprising pumping the hydrochloric acid solution to a blending tank, and carrying out blending in the blending tank, wherein a hydrochloric acid content is controlled to about 37%, and 6, filtering and split charging comprising filtering the blended hydrochloric acid solution by a filter to obtain a finished hydrochloric acid solution and carrying out split charging. The technology has the advantages of strong continuity, high purification degree, and low impurity content.

Description

technical field [0001] The invention relates to a production process for producing ultra-clean high-purity hydrochloric acid. High-purity hydrochloric acid is mainly suitable for cleaning in the manufacture of large-scale integrated circuit semiconductor devices in the microelectronics industry. It belongs to the technical field of microelectronic chemical reagents. Background technique [0002] With the rapid development of semiconductor technology, the requirements for ultra-clean and high-purity reagents are getting higher and higher. In the processing of integrated circuits (IC), ultra-clean and high-purity reagents are mainly used for cleaning and etching the surface of chips and silicon wafers. Their purity and cleanliness have a great influence on the yield, electrical performance and reliability of integrated circuits. significant impact. As an important microelectronic chemical, ultra-clean and high-purity hydrochloric acid has been widely used in the cleaning an...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the unstable quality of the high-purity hydrochloric acid product produced by the prior art and the inability to meet the processing requirements of ultra-large-scale integrated circuits, and to provide a super hydrochloric acid with strong process continuity, good separation effect, high purity, and low impurity content. The preparation method of net high-purity hydrochloric acid