Nanometer multilayer coating and preparation method thereof

Abstract

The invention discloses a nanometer multilayer coating. The nanometer multilayer coating is characterized in that the coating at least comprises a settled layer, wherein the settled layer is formed by alternately settling a TiAlSiN sub-layer and a CrAlN sub-layer; and the atom content of Si in the TiAlSiN sub-layer is 2-12 percent; and the CrAlN sub-layer contains a nanocrystalline CrAlN tissue having a B1 structure. The invention also discloses a preparation method of the nanometer multilayer coating. Compared with the prior art, the nanometer multilayer coating has the advantages of high hardness, high flexibility, high heat stability and high oxidizability resistance.

Description

technical field

[0001] The invention relates to a nanometer multilayer coating, and also relates to a preparation method of the nanometer multilayer coating, belonging to the technical field of surface coatings. Background technique

[0002] Superalloys such as Inconel718 and N155 have excellent chemical stability, hardness and toughness at high temperatures, and are widely used in cutting-edge (extreme) fields such as aviation and aerospace. However, superalloy workpieces have the characteristics of high friction coefficient, high temperature rise and high strength when drilling and cutting. The surface protective coatings mainly composed of TiAlN and CrAlN commonly used in modern drilling and cutting tools only maintain high hardness below 700 °C, and their efficiency and life are greatly reduced when used to process superalloy materials. Coating with good oxidation resistance and toughness. At present, the relevant research and development work at home and abroad is mai...

Examples

Embodiment 1

[0040] Example 1: Combining Figure 1 to Figure 4 As shown, the CrAl target and TiAlSi target are prepared by powder metallurgy method, and the Si atom content of the TiAlSi target is 4%; the coating preparation method includes the following steps: Step 1, put the metal or alloy substrate into the cavity of the coating equipment and then vacuumize to 2×10 –3Pa, then turn on the heating power supply to heat the metal or alloy substrate to 350°C and stabilize it, then pass Ar (argon gas) into the vacuum chamber of the coating equipment to maintain a vacuum pressure of 0.2Pa; step 2, set the sample stage to 5 revolutions Start rotating at a speed of 1 / min, and turn on the base negative bias voltage to 500V, then turn on the Cr target ignition power supply at 0.03A / dm 2 The current density of sputtering for 30min; then within 5min, the negative bias voltage was reduced to 75V, and at the same time, the Cr target current density was increased to 2A / dm within 5min 2 , keep 15min; ...

Embodiment 2

[0043] Example 2: Combining Figure 5 ~ Figure 8 As shown, the CrAl target and the TiAlSi target are prepared by powder metallurgy, and the Si atom content of the TiAlSi target is 10%; the coating preparation method includes the following steps: Step 1, put the metal or alloy substrate into the cavity of the coating equipment and then vacuumize to 2×10 –3 Pa, then turn on the heating power supply to heat the metal or alloy substrate to 350°C and stabilize it, then pass Ar (argon gas) into the vacuum chamber of the coating equipment to maintain a vacuum pressure of 0.2Pa; step 2, set the sample stage to 5 revolutions Start rotating at a speed of 1 / min, and turn on the base negative bias voltage to 500V, then turn on the Cr target ignition power supply at 0.03A / dm 2 The current density of sputtering for 30min; then within 5min, the negative bias voltage was reduced to 75V, and at the same time, the Cr target current density was increased to 2A / dm within 5min 2 , keep 20min; st...

Embodiment 3

[0045] Example 3: Binding Figure 9 and Figure 10 As shown, the CrAl target and TiAlSi target are prepared by powder metallurgy method, and the Si atom content of the TiAlSi target is 16%; the coating preparation method includes the following steps: Step 1, put the metal or alloy substrate into the cavity of the coating equipment and then vacuumize to 2×10 –3 Pa, then turn on the heating power supply to heat the metal or alloy substrate to 350°C and stabilize it, then pass Ar (argon gas) into the vacuum chamber of the coating equipment to maintain a vacuum pressure of 0.2Pa; step 2, set the sample stage to 2 revolutions Start rotating at a speed of 1 / min, and turn on the base negative bias voltage to 500V, then turn on the Cr target ignition power supply at 0.03A / dm 2 The current density of sputtering for 30min; then within 5min, the negative bias voltage was reduced to 75V, and at the same time, the Cr target current density was increased to 2A / dm within 5min 2 , keep 20m...

technical field

[0001] The invention relates to a nanometer multilayer coating, and also relates to a preparation method of the nanometer multilayer coating, belonging to the technical field of surface coatings. Background technique

[0002] Superalloys such as Inconel718 and N155 have excellent chemical stability, hardness and toughness at high temperatures, and are widely used in cutting-edge (extreme) fields such as aviation and aerospace. However, superalloy workpieces have the characteristics of high friction coefficient, high temperature rise and high strength when drilling and cutting. The surface protective coatings mainly composed of TiAlN and CrAlN commonly used in modern drilling and cutting tools only maintain high hardness below 700 °C, and their efficiency and life are greatly reduced when used to process superalloy materials. Coating with good oxidation resistance and toughness. At present, the relevant research and development work at home and abroad is mai...

Examples

Embodiment 1

[0040] Example 1: Combining Figure 1 to Figure 4 As shown, the CrAl target and TiAlSi target are prepared by powder metallurgy method, and the Si atom content of the TiAlSi target is 4%; the coating preparation method includes the following steps: Step 1, put the metal or alloy substrate into the cavity of the coating equipment and then vacuumize to 2×10 –3Pa, then turn on the heating power supply to heat the metal or alloy substrate to 350°C and stabilize it, then pass Ar (argon gas) into the vacuum chamber of the coating equipment to maintain a vacuum pressure of 0.2Pa; step 2, set the sample stage to 5 revolutions Start rotating at a speed of 1 / min, and turn on the base negative bias voltage to 500V, then turn on the Cr target ignition power supply at 0.03A / dm 2 The current density of sputtering for 30min; then within 5min, the negative bias voltage was reduced to 75V, and at the same time, the Cr target current density was increased to 2A / dm within 5min 2 , keep 15min; ...

Embodiment 2

[0043] Example 2: Combining Figure 5 ~ Figure 8 As shown, the CrAl target and the TiAlSi target are prepared by powder metallurgy, and the Si atom content of the TiAlSi target is 10%; the coating preparation method includes the following steps: Step 1, put the metal or alloy substrate into the cavity of the coating equipment and then vacuumize to 2×10 –3 Pa, then turn on the heating power supply to heat the metal or alloy substrate to 350°C and stabilize it, then pass Ar (argon gas) into the vacuum chamber of the coating equipment to maintain a vacuum pressure of 0.2Pa; step 2, set the sample stage to 5 revolutions Start rotating at a speed of 1 / min, and turn on the base negative bias voltage to 500V, then turn on the Cr target ignition power supply at 0.03A / dm 2 The current density of sputtering for 30min; then within 5min, the negative bias voltage was reduced to 75V, and at the same time, the Cr target current density was increased to 2A / dm within 5min 2 , keep 20min; st...

Embodiment 3

[0045] Example 3: Binding Figure 9 and Figure 10 As shown, the CrAl target and TiAlSi target are prepared by powder metallurgy method, and the Si atom content of the TiAlSi target is 16%; the coating preparation method includes the following steps: Step 1, put the metal or alloy substrate into the cavity of the coating equipment and then vacuumize to 2×10 –3 Pa, then turn on the heating power supply to heat the metal or alloy substrate to 350°C and stabilize it, then pass Ar (argon gas) into the vacuum chamber of the coating equipment to maintain a vacuum pressure of 0.2Pa; step 2, set the sample stage to 2 revolutions Start rotating at a speed of 1 / min, and turn on the base negative bias voltage to 500V, then turn on the Cr target ignition power supply at 0.03A / dm 2 The current density of sputtering for 30min; then within 5min, the negative bias voltage was reduced to 75V, and at the same time, the Cr target current density was increased to 2A / dm within 5min 2 , keep 20m...

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