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Quasi-one-dimensional nanometer resistive random access memory and preparation method based on chalcogen cuprous compounds

A technology of resistive variable memory and cuprous chalcogenide, which is applied in the direction of electrical components, can solve the problems of unstable product performance, high manufacturing cost, and easy conduction of electrodes, so as to expand the device structure and material range and improve the yield , the effect of reducing complexity

Inactive Publication Date: 2013-10-02
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Resistive memory is an electronic component with a macroscopic structure of a thin film or above a thin film, which has the disadvantages of large equipment volume, high power consumption, inability to build small or flexible integrated circuits, easy conduction between electrodes, and unstable product performance. And the shortcomings of complicated manufacturing process and high manufacturing cost

Method used

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  • Quasi-one-dimensional nanometer resistive random access memory and preparation method based on chalcogen cuprous compounds
  • Quasi-one-dimensional nanometer resistive random access memory and preparation method based on chalcogen cuprous compounds
  • Quasi-one-dimensional nanometer resistive random access memory and preparation method based on chalcogen cuprous compounds

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Embodiment 1

[0040] see figure 1 , a quasi-one-dimensional nano-resistive memory based on chalcogenide cuprous compounds, consisting of an insulating substrate 1, a quasi-one-dimensional nanostructure unit 2 of chalcogenide cuprous compounds, a copper electrode 3 and an inert metal electrode 4; wherein, the chalcogenide The quasi-one-dimensional nanostructure unit 2 of the cuprous compound is placed on the top surface of the insulating substrate 1, one end of the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3, and the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3. The other end of the one-dimensional nanostructure unit 2 is covered by an inert metal electrode 4, that is, the copper electrode 3 and the inert metal electrode 4 are connected by the quasi-one-dimensional nanostructure unit 2 of a chalcogenide cuprous compound;

[0041] The insulating substra...

Embodiment 2

[0051] see figure 2 , a quasi-one-dimensional nano-resistive memory based on chalcogenide cuprous compounds, consisting of an insulating substrate 1, a quasi-one-dimensional nanostructure unit 2 of chalcogenide cuprous compounds, a copper electrode 3 and an inert metal electrode 4; wherein, the chalcogenide The quasi-one-dimensional nanostructure unit 2 of the cuprous compound is placed on the top surface of the insulating substrate 1, one end of the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3, and the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3. The other end of the three-dimensional nanostructure unit 2 is covered by an inert metal electrode 4, that is, the copper electrode 3 and the inert metal electrode 4 are connected by a quasi-one-dimensional nanostructure of a chalcogenide cuprous compound;

[0052] The insulating substrate 1 is...

Embodiment 3

[0061] see figure 1 , a quasi-one-dimensional nano-resistive memory based on chalcogenide cuprous compounds, consisting of an insulating substrate 1, a quasi-one-dimensional nanostructure unit 2 of chalcogenide cuprous compounds, a copper electrode 3 and an inert metal electrode 4; wherein, the chalcogenide The quasi-one-dimensional nanostructure unit 2 of the cuprous compound is placed on the top surface of the insulating substrate 1, one end of the quasi-one-dimensional nanostructure unit 2 of the cuprous compound is covered by a copper electrode 3, and the quasi-one-dimensional nanostructure unit 2 of the chalcogenide cuprous compound The other end of the structural unit 2 is covered by an inert metal electrode 4, that is, the copper electrode 3 and the inert metal electrode 4 are connected by a quasi-one-dimensional nanostructure of a cuprous compound;

[0062] The insulating substrate 1 is a silicon-based substrate with an insulating layer 5 on the top; the quasi-one-dim...

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Abstract

The invention discloses a quasi-one-dimensional nanometer resistive random access memory and a preparation method based on chalcogen cuprous compounds. The method comprises the following steps: firstly, uniformly dispersing a chalcogen cuprous compound quasi-one-dimensional nanometer structure on an insulation substrate ; evaporation plating a metal Cu electrode at one end of the chalcogen cuprous compound quasi-one-dimensional nanometer structure through the one-time ultraviolet exposure photoetching and the electron beam evaporation; evaporation plating an inert metal electrode at the other end of the chalcogen cuprous compound quasi-one-dimensional nanometer structure through the second-time positioning ultraviolet exposure photoetching and the electron beam evaporation. According to the invention, the chalcogen cuprous compound quasi-one-dimensional nanometer structure is applied to the nanometer memory for the first time, the performance is stable and reliable, the power consumption is low, the preparation method is simple and feasible, and the quasi-one-dimensional nanometer resistive random access memory is hopeful to be applied to a novel nanometer electronic device as a high-density storage unit.

Description

technical field [0001] The invention relates to the technical field of preparation of a nanometer memory, more specifically to a quasi-one-dimensional nanostructure resistive variable memory based on a chalcogenide cuprous compound and a preparation method thereof. Background technique [0002] With the development of integrated circuit technology, the traditional silicon-based technology has gradually approached its limit size, which makes people demand for new and high-efficiency nanoelectronic devices, especially high storage density, high speed, low power consumption, and non-volatile memory devices. growing day by day. Memory is one of the most important types. With the gradual popularity of portable electronic devices such as mobile phones, digital cameras, media players, and notebook computers, high storage density, high speed, low power consumption, and non-volatile memory have attracted more and more attention. Much attention. At present, the non-volatile memory o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L45/00
Inventor 吴春艳吴义良周国方王文坚毛盾于永强罗林保王莉
Owner HEFEI UNIV OF TECH
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