Quasi-one-dimensional nanometer resistive random access memory and preparation method based on chalcogen cuprous compounds
A technology of resistive variable memory and cuprous chalcogenide, which is applied in the direction of electrical components, can solve the problems of unstable product performance, high manufacturing cost, and easy conduction of electrodes, so as to expand the device structure and material range and improve the yield , the effect of reducing complexity
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Embodiment 1
[0040] see figure 1 , a quasi-one-dimensional nano-resistive memory based on chalcogenide cuprous compounds, consisting of an insulating substrate 1, a quasi-one-dimensional nanostructure unit 2 of chalcogenide cuprous compounds, a copper electrode 3 and an inert metal electrode 4; wherein, the chalcogenide The quasi-one-dimensional nanostructure unit 2 of the cuprous compound is placed on the top surface of the insulating substrate 1, one end of the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3, and the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3. The other end of the one-dimensional nanostructure unit 2 is covered by an inert metal electrode 4, that is, the copper electrode 3 and the inert metal electrode 4 are connected by the quasi-one-dimensional nanostructure unit 2 of a chalcogenide cuprous compound;
[0041] The insulating substra...
Embodiment 2
[0051] see figure 2 , a quasi-one-dimensional nano-resistive memory based on chalcogenide cuprous compounds, consisting of an insulating substrate 1, a quasi-one-dimensional nanostructure unit 2 of chalcogenide cuprous compounds, a copper electrode 3 and an inert metal electrode 4; wherein, the chalcogenide The quasi-one-dimensional nanostructure unit 2 of the cuprous compound is placed on the top surface of the insulating substrate 1, one end of the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3, and the quasi-one-dimensional nanostructure unit 2 of the chalcogenous cuprous compound is covered by a copper electrode 3. The other end of the three-dimensional nanostructure unit 2 is covered by an inert metal electrode 4, that is, the copper electrode 3 and the inert metal electrode 4 are connected by a quasi-one-dimensional nanostructure of a chalcogenide cuprous compound;
[0052] The insulating substrate 1 is...
Embodiment 3
[0061] see figure 1 , a quasi-one-dimensional nano-resistive memory based on chalcogenide cuprous compounds, consisting of an insulating substrate 1, a quasi-one-dimensional nanostructure unit 2 of chalcogenide cuprous compounds, a copper electrode 3 and an inert metal electrode 4; wherein, the chalcogenide The quasi-one-dimensional nanostructure unit 2 of the cuprous compound is placed on the top surface of the insulating substrate 1, one end of the quasi-one-dimensional nanostructure unit 2 of the cuprous compound is covered by a copper electrode 3, and the quasi-one-dimensional nanostructure unit 2 of the chalcogenide cuprous compound The other end of the structural unit 2 is covered by an inert metal electrode 4, that is, the copper electrode 3 and the inert metal electrode 4 are connected by a quasi-one-dimensional nanostructure of a cuprous compound;
[0062] The insulating substrate 1 is a silicon-based substrate with an insulating layer 5 on the top; the quasi-one-dim...
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