Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Atomic layer deposition method and atomic layer deposition device for coating ultrafine powder

A technology of atomic layer deposition and ultra-fine powder, which is applied in the direction of coating, gaseous chemical plating, metal material coating process, etc. Agglomeration and other problems can be improved to improve the powder coating rate and deposition uniformity, prolong the contact time and reduce the degree of agglomeration

Active Publication Date: 2013-12-18
HUAZHONG UNIV OF SCI & TECH
View PDF1 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has the following disadvantages: (1) The dispersion effect on small particles is poor, and they are easy to agglomerate; (2) The agglomerates of powder particles after agglomeration are of different sizes, and they will be separated inside and outside under the action of centrifugal force during rotation, resulting in The coating of the inner layer particles is more difficult, and the coating rate is much lower than that of the outer layer, and the difference between the film thickness and the outer layer particles is large, which cannot meet the requirements of high uniformity for powder coating

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Atomic layer deposition method and atomic layer deposition device for coating ultrafine powder
  • Atomic layer deposition method and atomic layer deposition device for coating ultrafine powder
  • Atomic layer deposition method and atomic layer deposition device for coating ultrafine powder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0026] figure 1 It is a flowchart of an atomic layer deposition method for coating ultrafine powder in an embodiment of the present invention, including the following steps:

[0027] S11: Vacuumize the reaction chamber to ensure effective isolation of the reaction area from air.

[0028] S12: Continuously feed the fluidizing gas into the reaction chamber, the fluidizing gas flow rate is 5-50cm...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses an atomic layer deposition method and an atomic layer deposition device for coating ultrafine powder. The atomic layer deposition method is characterized in that fluidized gas is introduced into an adsorption process of a precursor, powder is blown away by utilizing the fluidized gas, and sufficient dispersion of the powder is realized. The atomic layer deposition device comprises a reaction cavity, a supply system, a vacuum system, a heating system, a monitoring system and a control system and is characterized in that the supply system comprises a fluidized gas source, and the fluidized gas enters a reaction cavity by virtue of a fluidized gas delivery branch and is used for blowing away the powder into the whole reaction region. By adopting the atomic layer deposition method and the atomic layer deposition device, powder coating rate and deposition uniformity can be effectively improved, and massive powder can be coated in each deposition process, so that the powder coating efficiency is improved.

Description

technical field [0001] The invention relates to atomic layer deposition technology, more specifically, to an atomic layer deposition method and device for coating ultrafine powder. Background technique [0002] With the superfineness of the material, its surface electronic structure and crystal structure have changed, resulting in surface effects, small size effects, quantum effects and macroscopic quantum tunneling effects that bulk materials do not have, making ultrafine powders different from conventional particles. Compared with the material, it has a series of excellent physical and chemical properties, but it also has a series of disadvantages such as easy agglomeration, easy oxidation, and unstable properties. Coating the protective layer on the surface of ultrafine powder can not only overcome the above shortcomings, but also make the coated powder particles have anti-sintering performance, and the core-shell structure can even make the powder a composite material wi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44
Inventor 陈蓉段晨龙刘潇曹坤邓章单斌文艳伟
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com