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A kind of suede transparent conductive film with periodic structure and preparation method thereof

A technology of transparent conductive film and periodic structure, which is applied in the direction of circuits, photovoltaic power generation, electrical components, etc., can solve the problems of increasing battery cost, feature size, and large roughness, and achieve increased optical path, good scattering effect, and improved optical efficiency. The effect of utilization

Active Publication Date: 2015-08-19
NANKAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in order to obtain good light trapping after wet etching of ZnO films prepared by sputtering technology, the "crater-like" feature size and roughness need to be large, and such ZnO films can only be sputtered at high temperature (greater than 250oC )
On the one hand, this limits the substrates for battery applications, and on the other hand, it also increases the cost of preparing batteries.

Method used

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  • A kind of suede transparent conductive film with periodic structure and preparation method thereof
  • A kind of suede transparent conductive film with periodic structure and preparation method thereof
  • A kind of suede transparent conductive film with periodic structure and preparation method thereof

Examples

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Effect test

Embodiment 1

[0021] A periodic textured textured transparent conductive film, such as figure 1 As shown, it includes the substrate layer, the first layer of ZnO film that acts as a template, and the second layer of ZnO film that acts as a modification to form a laminated structure in turn. The substrate layer is hard substrate glass, and the ZnO film is doped zinc oxide n Type semiconductor material ZnO:H, in which the thickness of the first layer of ZnO film is 800nm, and the thickness of the second layer of ZnO film is 400nm, forming a textured transparent conductive film with a periodic structure with wide-spectrum scattering, and the periodic structure of ZnO The root mean square roughness of the surface transparent conductive film is 80 nm.

[0022] A kind of preparation method of the suede transparent conductive film of described periodic structure utilizes water bath method to assemble PS microsphere, uses O 2 Plasma etching PS microspheres, using the template effect of PS microsph...

Embodiment 2

[0032] A periodic textured textured transparent conductive film, such as figure 1 As shown, it includes the substrate layer, the first layer of ZnO film that acts as a template, and the second layer of ZnO film that acts as a modification to form a laminated structure in turn. The substrate layer is hard substrate glass, and the ZnO film is doped zinc oxide n Type semiconductor material ZnO: Al(AZO) film, in which the thickness of the first layer of ZnO film is 700nm, and the thickness of the second layer of ZnO film is 400nm, which constitutes a textured transparent conductive film with a periodic structure of wide-spectrum scattering. The root mean square roughness of the textured ZnO textured transparent conductive film is 85 nm.

[0033] A kind of preparation method of the suede transparent conductive film of described periodic structure utilizes water bath method to assemble PS microsphere, uses O 2 Plasma etching PS microspheres, using the template effect of PS microsph...

Embodiment 3

[0041] A periodic textured textured transparent conductive film, such as figure 1 As shown, it includes the substrate layer, the first layer of ZnO film that acts as a template, and the second layer of ZnO film that acts as a modification to form a laminated structure in turn. The substrate layer is hard substrate glass, and the ZnO film is doped zinc oxide n Type semiconductor material ZnO: H (HZO) thin film, in which the thickness of the first layer of ZnO thin film is 900nm, the thickness of the second layer of ZnO thin film is 400nm, which constitutes a textured transparent conductive thin film with a periodic structure of broad-spectrum scattering, periodic The root mean square roughness of the structured ZnO textured transparent conductive film is 120 nm.

[0042] A kind of preparation method of the suede transparent conductive film of described periodic structure utilizes water bath method to assemble PS microsphere, uses O 2 Plasma etching PS microspheres, using the t...

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Abstract

A kind of suede transparent conductive film with a periodic structure, including a glass substrate layer, a first layer of ZnO film that acts as a template, and a second layer of ZnO film that acts as a modification to form a laminated structure in turn. The thickness of the first layer of ZnO film is 300-1500nm, the thickness of the second layer of ZnO film is 400-1000nm, which constitutes a periodic structure suede transparent conductive film with scattering effect; its preparation method: assemble PS microspheres by water bath method, and use O2 plasma to etch PS microspheres , using the template effect of PS microspheres to obtain a light-trapping ZnO transparent conductive film with a periodic structure. The advantages of the present invention are: the prepared ZnO thin film has a good light-trapping effect, can be used as a front electrode for thin-film solar cells, and has a good scattering effect in the wavelength range that can be used by 400-1100nm cells, and can increase the incidence of incident light on silicon substrates. The optical path in thin film cells improves light utilization efficiency.

Description

technical field [0001] The invention belongs to the preparation technology of a transparent conductive film of a thin film solar cell, in particular to a suede transparent conductive film with a periodic structure and a preparation method thereof. Background technique [0002] In the 21st century, energy security and environmental protection have become global issues. Many countries in the world regard the development of renewable energy as an important measure to alleviate energy supply contradictions and address climate change, and have formulated development strategies, put forward clear development goals and corresponding incentive policies. Photovoltaic power generation is one of the internationally recognized effective ways to solve the problems of energy shortage and environmental pollution. The carrier of photovoltaic power generation is solar cells, and the key to making solar cells an important part of future energy is to reduce the cost of photovoltaic power gen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18H01L31/0224C23C14/35
CPCH01L31/022483H01L31/02366H01L31/074H01L31/1884Y02E10/50Y02P70/50
Inventor 张晓丹梁雪娇赵颖梁俊辉高海波黄茜侯国付许盛之魏长春
Owner NANKAI UNIV
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