Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Electrolytic bath, acid etching liquid regenerating equipment and method using electrolytic bath

An acid etching solution and electrolytic cell technology, applied in the field of electrolytic cells, can solve the problems of poor etching solution effect and chemical mismatch of etching copper.

Active Publication Date: 2014-04-30
桥德联合自动化(苏州)有限公司
View PDF14 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] In addition, there is a chemical mismatch between the amount of etched copper and the amount of recycled copper in the traditional etching process, whether it is the supply, discharge or copper recovery system of the etching solution, resulting in poor regeneration of the etching solution and copper recovery.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electrolytic bath, acid etching liquid regenerating equipment and method using electrolytic bath
  • Electrolytic bath, acid etching liquid regenerating equipment and method using electrolytic bath
  • Electrolytic bath, acid etching liquid regenerating equipment and method using electrolytic bath

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0077] The invention discloses a device and method capable of regenerating acid etching solution and recovering copper.

[0078] Such as Figure 1 to Figure 5 As shown, the printed circuit board 3 is processed by the etching solution 2 sprayed by the nozzle 4 in the etching machine 1 . The rinse from the rinse module 5 is then received. After etching, the etching solution 2 becomes an acidic etching waste solution and is sent to the reactor 6. The waste solution may contain the following chemical substances: hydrochloric acid, cupric chloride, sodium chloride, sodium perchlorate and water. After treatment, the regenerated acidic etching solution 2 from the reactor 6 will be sent to the nozzle 4 of the etching machine 1 .

[0079] Specifically, the reactor 6 connected to the etching machine includes three overflow chambers and a pre-overflow chamber 6a, and the three overflow chambers are respectively the first overflow chamber 6b, the second overflow chamber 6c, and the thir...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method and equipment for treating waste acid etching liquid. The etching liquid is a solution for etching a printed circuit board inside an etching machine; overflowing treatment is carried out multiple times in a reactor; the reactor is connected with the electrolytic bath provided by the invention; the regenerated acid etching liquid is fed back to the etching machine to carry out a new round. The electrolytic bath has the outstanding effects that the structure is simple and compact, expected accelerators and reaction gases can be provided for the regenerating process, the whole process needs no any regenerating additive, the stability and the flexibility of the etching process are improved, and the etching process is greatly improved.

Description

technical field [0001] The invention relates to an electrolytic cell, a regenerated acid etching solution using the electrolytic cell, and a method and equipment for recovering copper, belonging to the fields of resource reuse and nonferrous metal recovery. Background technique [0002] All over the world, the electrical and electronic industry is one of the fastest growing industries. As an important part of electrical and electronic products, the output of printed circuit boards is also increasing day by day. The conventional acid etching process is to put the printed circuit board into the etching solution in the etching machine for etching reaction. Copper removal time from printed boards is limited and may be limited in part because some organic or other acid-resistant antibodies prevent the establishment of a conductor with the acid etchant. [0003] Typically, copper removal rates of 30 to 60 microns per minute are achievable. However, due to copper saturation and t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C25C1/12
CPCY02P10/20
Inventor 耐迪·萨多克
Owner 桥德联合自动化(苏州)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com