Transfer printing method of carbon material conductive film
A technology of conductive film and carbon material, applied in the field of transfer printing of carbon material conductive film, can solve the problems of coating uniformity and low utilization rate of materials
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Embodiment 1
[0030] Take 1.0 g of solvent-phase SiO 2 Sol (IPA-ST, solid content 30 to 31wt%, particle size 10~15nm, solvent is isopropanol, purchased from NissanChemical) was added with 14.0 g of ethanol to obtain SiO with a solid content of ~2.0wt%. 2 Dispersions. A polyethylene terephthalate (PET, A4300 available from Toyobo) with a thickness of 188 μm was used as the first substrate. SiO 2 The dispersion was coated on the first substrate with a coating machine (ZA2300 / ZEHNTNER) and a wire rod (RDS CoatingRod#4), and then dried in a circulating oven at 100°C, and the contact angle and surface energy were measured. Calculated, the results are shown in Table 1.
[0031] Table 1
[0032]
[0033]
[0034] Then take 0.5g of SWNT dispersion and apply it on the surface with SiO by the aforementioned coating process 2 Layered base material, then placed in a circulating oven to dry at different temperatures and times, the detailed drying conditions and the sheet resistance (original ...
Embodiment 2
[0041] Similar to Example 1, the only difference is that the solvent phase SiO 2 The sol was changed to solvent-phase SiO with different particle sizes 2 Sol (IPA-ST-L, solid content 30~31wt%, particle size 40~50nm, solvent is isopropanol, purchased from NissanChemical). As for the selection of subsequent substrates, wire bar coating SiO 2 The manufacturing process of the sol and the wire bar coating of the SWNT dispersion are similar to that of Example 1. In embodiment 2, the surface is coated with SiO 2 The first substrate of the layer, its contact angle and calculated surface energy are shown in Table 1. The sheet resistance (original sheet resistance) of the finally formed carbon nanotube conductive film was 430Ω / □, as shown in Table 3. The substrate coated with the carbon nanotube conductive film was slowly immersed in deionized water, and the peeling conditions are shown in Table 3. The surface after the immersion procedure has SiO 2 The sheet resistance (sheet res...
Embodiment 3
[0043] Similar to Example 1, the only difference is that the solvent phase SiO 2 The sol was changed to another solvent phase SiO 2 Sol (MEK-ST, solid content 30~31wt%, particle size 10~15nm, solvent is butanone, purchased from NissanChemical). As for the selection of subsequent substrates, wire bar coating SiO 2 The manufacturing process of the sol and the wire bar coating of the SWNT dispersion are similar to that of Example 1. In embodiment 3, the surface is coated with SiO 2 The first substrate of the layer, its contact angle and calculated surface energy are shown in Table 1. The sheet resistance (original sheet resistance) of the finally formed carbon nanotube conductive film was 420Ω / □, as shown in Table 3. The substrate coated with the carbon nanotube conductive film was slowly immersed in deionized water, and the peeling conditions are shown in Table 3. The surface after the immersion procedure has SiO 2 The sheet resistance (sheet resistance after the peeling p...
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