Application of organic phosphate surfactant in self-stopping polishing
A technology of surfactant and phosphate ester, which is applied in polishing compositions containing abrasives, other chemical processes, chemical instruments and methods, etc., can solve problems such as high removal rates, achieve high copper removal rates, and improve butterfly depressions and overpolishing window, shortening the polishing time effect
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Embodiment 1~49
[0040] Table 1 shows Examples 1-49 of the chemical mechanical polishing solution of the present invention. According to the formula given in the table, the other components except the oxidizing agent are mixed evenly, and the mass percentage is made up to 100% with water. with KOH or HNO 3 Adjust to desired pH. Add oxidant before use and mix evenly.
[0041] Table 1 Example 1~49
[0042]
[0043]
[0044]
[0045]
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[0048]
[0049]
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