Method for manufacturing PDMS thin film integrated with sub-millimeter deep channel
What is Al technical title?
Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A fabrication method and sub-millimeter technology are applied in the field of fabrication of integrated sub-millimeter deep channel PDMS films, which can solve problems such as inability to obtain PDMS films, and achieve the effects of low material cost, small differences, and good parallelism.
Inactive Publication Date: 2014-07-02
ZHEJIANG UNIV
View PDF4 Cites 4 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
This method is simple and easy to implement, but the substrates used are all flat plates, and it is impossible to prepare PDMS films with channels embedded on the surface.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Image
Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
Click on the blue label to locate the original text in one second.
Reading with bidirectional positioning of images and text.
Smart Image
Examples
Experimental program
Comparison scheme
Effect test
example 1
[0053] 1. First use ArtCAM Pro software to draw as attached figure 1 For the channel pattern shown, select 2D area removal in the toolpath bar, and set the end depth to 400 μm;
[0055] 3. Save the tool path as a cnc format file;
[0056] 4. Take a flat PMMA, place it under the milling cutter, adjust the height of the milling cutter so that the tip just touches the PMMA;
[0057] 5. Import the tool path file into the Amo engraving machine, click start, and the male mold engraving will start;
[0058] 6. After the engraving is finished, take out the engraved PMMA, wash off the fine particles on the surface with tap water, and dry it;
[0059] 7. Prepare liquid PDMS prepolymer, mix PDMS monomer and curing agent according to the mass ratio of 10:1;
[0060] 8. Take 1g of the above mixture an...
example 2
[0066] 1. Same as Step 1 of Example 1, set the end depth to 500 μm;
[0067] 2. Same as Step 2 of Example 1, set the down-cutting step to 0.500mm;
[0068] 3. Same as Step 3 of Example 1;
[0069] 4. Same as step 4 of Example 1;
[0070] 5. Same as Step 5 of Example 1;
[0071] 6. Same as Step 6 of Example 1;
[0072] 7. Same as Step 7 of Example 1;
[0073] 8. Same as Step 8 of Example 1;
[0074] 9. Same as Step 9 of Example 1, the number of layers of scotch tape attached is 16 layers;
[0075] 10. Same as step 10 in Example 1;
[0076] 11. Same as step 11 in Example 1.
[0077] After measurement, the channel depth of the prepared PDMS film is about 500-530 μm, and the thickness of the film is about 800-880 μm. Compared with the designed size, the error is within the acceptable range.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
PUM
Property
Measurement
Unit
depth
aaaaa
aaaaa
thickness
aaaaa
aaaaa
thickness
aaaaa
aaaaa
Login to view more
Abstract
The invention discloses a method for manufacturing a PDMS thin film integrated with a sub-millimeter deep channel. The method can be used for observing a micro living body under cultivation and growth states. A PMMA male mold is used as a PDMS channel duplication mold, flat PMMA adhered by transparent adhesive tapes is used as a thin film thickness control device, the obtained channel depth and the obtained thin film thickness are in a sub-millimeter scale, and the channel is embedded into the surface of the thin film. The PMMA male mold is manufactured by using an armok carving machine, and the bump height can reach the sub-millimeter scale, so that the PDMS channel with the sub-millimeter depth can be duplicated. PMMA of which two sides are adhered by a plurality of layers of transparent adhesive tapes is attached to a flat PMMA male mold, and the height of a cavity formed by the PMMA and the flat PMMA male mold is the height of cushion layers of the transparent adhesive tapes. When PDMS is poured into the cavity, the height is the thickness of the PDMS thin film. The height of the PMMA male mold can be controlled by finishing depth parameter setting in a tool path, and the thickness of the PDMS thin film can be controlled according to the layer number of the adhered transparent adhesive tapes.
Description
technical field [0001] The invention relates to a method for manufacturing a thin film, in particular to a method for manufacturing an integrated submillimeter deep channel PDMS thin film, which can be used for micro-living culture and observation of growth state. Background technique [0002] PDMS is a kind of organosilicon polymer compound, which is widely used in the field of microfluidics. It is easy to reproduce and process, and has good light transmission, air permeability and biocompatibility, which is very suitable for providing an ideal environment for micro-living culture. At present, there are many studies on cells, bacteria, and viruses in PDMS chips, and the channels are usually made by in-situ reaction molding (In-situ Reaction Molding). The so-called in-situ reaction molding method means that the liquid prepolymer is directly overturned on the mold and reacted and solidified for molding. The SU-8 male mold is the most commonly used mold for PDMS channel prod...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.
Login to view more