Laminated transparent conductive oxide film, and making method and application thereof
An oxide thin film, transparent and conductive technology, applied in the direction of layered products, nanotechnology for materials and surface science, nanotechnology, etc., to achieve the effect of increasing conductivity, increasing transmittance, and high electron mobility
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Embodiment 1
[0045] Embodiment 1--preparation of double-layer laminated transparent conductive oxide film
[0046] (1) Prepare the base layer
[0047] On a clean 2×2 mm square glass carrier material, the base layer of aluminum-doped zinc oxide (AZO) transparent conductive oxide film was sputtered by radio frequency magnetron sputtering by physical vapor deposition. The sputtering target used was an AZO target with an Al content of 3% by weight. The flow rate of argon gas used is 60 sccm (ie standard state cubic centimeters per minute). The sputtering power was 70W. The sputtering time was 8 hours. After sputtering, the thickness of the resulting base layer was measured to be 950 nm.
[0048] (2) Growth of single crystal oxide nanostructure arrays
[0049] The aforementioned AZO substrate layer was cleaned in an ultrasonic bath of acetone and ethanol, followed by rinsing with deionized water. After drying, the single-crystal ZnO nanocolumn arrays were grown on the substrate layer by e...
Embodiment 2
[0051] Example 2--Preparation of three-layer laminated transparent conductive oxide film
[0052] The base layer and the single crystal oxide nanostructure array were prepared in the same manner as in Example 1, and then the AZO top layer was deposited on the prepared single crystal oxide nanostructure array.
[0053] In this embodiment, a physical vapor deposition method is used to sputter an AZO transparent conductive oxide thin film on the single crystal ZnO nanocolumn array by radio frequency magnetron sputtering. The sputtering target used was an AZO target with an Al content of 3% by weight. The flow rate of argon gas used was 60 sccm. The sputtering power was 70W. Sputtering time was 75 minutes. The film thickness obtained after sputtering was 150 nm.
Embodiment 1
[0054] Comparative Example 1--Preparation of a single-layer transparent conductive oxide film
[0055] Aluminum-doped zinc oxide (AZO) transparent conductive oxide film was directly deposited on a clean 2×2mm glass carrier material by radio frequency magnetron sputtering by physical vapor deposition method. The sputtering target used was an AZO target with an Al content of 3% by weight. The flow rate of argon gas used was 60 sccm. The sputtering power was 70W. The sputtering time was 16 hours. After sputtering, the thickness of the resulting film was measured to be 1950 nm.
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