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Method for positively and negatively etching noble metal by using self-assembly monomolecular film

A technology of self-assembled single molecules and precious metals, which is applied in the process of producing decorative surface effects, metal material coating process, decorative art, etc., can solve the problems of toxicity and stability, achieve short time and prolong irradiation time , The effect of small pattern size change rate

Active Publication Date: 2014-07-23
滁州釉美生物技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some important drawbacks common to these traditional chemical etchants are toxicity (such as thiourea and cyanide) and poor stability (such as thiosulfate)

Method used

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  • Method for positively and negatively etching noble metal by using self-assembly monomolecular film
  • Method for positively and negatively etching noble metal by using self-assembly monomolecular film
  • Method for positively and negatively etching noble metal by using self-assembly monomolecular film

Examples

Experimental program
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Effect test

Embodiment 1

[0021] Rinse the gold flakes with absolute ethanol and dry them with argon gas. After treating the surface of the gold flakes with plasma, they were quickly soaked in absolute ethanol for 20 minutes, and then transferred to 2mmol / L11-mercapto-1- In the ethanol solution of undecyl alcohol, pass argon gas until the air is driven away, then quickly seal it, soak it at room temperature for 12 hours, take it out, put it in absolute ethanol, and use an ultrasonic cleaner with a power of 50W for 30 seconds. Take it out and dry it with argon gas to obtain gold flakes decorated with self-assembled monomolecular films. Then cover it with a photomask, put it into a photochemical reaction apparatus and use a 1000W high-pressure mercury lamp at 8000μW / cm 2 Irradiated under ultraviolet light for 2 minutes, and then soaked in the etching solution for 3 minutes. The etching solution is a mixed solution of N-bromosuccinimide, pyridine, and distilled water. In the mixed solution, N-bromosuccini...

Embodiment 2

[0023] In Example 1, use a 1000W high-pressure mercury lamp at 8000μW / cm 2 Irradiated under ultraviolet light for 20 minutes, and other steps were the same as in Example 1 to obtain a positive etching pattern, and its scanning electron microscope photo is shown in figure 2 .

Embodiment 3

[0025] In Example 1, use a 1000W high-pressure mercury lamp at 8000μW / cm 2 Irradiate 25 minutes under the ultraviolet light, other steps are identical with embodiment 1, the scanning electron microscope photo of the etching pattern that obtains is shown in image 3 , it can be seen from the figure that the pattern contrast between the illuminated area and the unilluminated area is not obvious, indicating that the pattern has a tendency to reverse, that is, the positive etching pattern is changing to the negative etching pattern.

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Abstract

The invention discloses a method for positively and negatively etching noble metal by using a self-assembly monomolecular film. The method comprises the following steps: modifying a layer of self-assembly monomolecular film on the surface of the noble metal firstly; covering the monomolecular film with a photomask; performing ultraviolet light irradiation; treating by using an aqueous solution of N-bromosuccinimide and pyridine, wherein positive or negative etching of a noble metal film is mainly realized by regulating and controlling the ultraviolet light irradiation time. By adopting the method, the conventional knowledge is broken, positive and negative etching of the noble metal film is realized by using the surface-modified self-assembly monomolecular film, the operating process is simple and practicable, the needed time is short, the used etching liquid is low in toxicity, the size change rate of a pattern obtained by etching is small, and the problem that only negative etching can be performed since the pattern size change rate is high in a micro-contract heat transfer method is solved.

Description

technical field [0001] The invention belongs to the technical field of micro-nano array manufacturing, and specifically relates to a method for positively and negatively etching precious metal thin films by using ultraviolet light and using self-assembled monomolecular films as an auxiliary means. Background technique [0002] Nano-electronics and higher-density integrated circuit technology all involve the nano-manufacturing process of semiconductor and metal substrates. Semiconductor, optical, magnetic and other metal and metal oxide nanostructure ordered arrays have great potential application prospects in the fields of photocatalysis, optoelectronics, sensors, solar cells, nanogenerators and magnetic storage due to their unique properties, and become the current One of the frontier hot areas of international research. The unique properties and application fields of these nanostructure arrays are closely related to their type, size, shape, spatial position, and density. ...

Claims

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Application Information

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IPC IPC(8): B81C1/00
Inventor 杨鹏穆小燕
Owner 滁州釉美生物技术有限公司