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Side-length-gradual-change polygonal planar spiral inductor and generating method thereof

A planar spiral and polygonal technology, applied in the direction of circuits, electrical components, electric solid devices, etc., can solve the problems of no inductance model, single variety, etc., and achieve the effect of simple parameter setting

Active Publication Date: 2014-07-30
CHINA ELECTRONIC TECH GRP CORP NO 38 RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The inductance model of the existing layout design cannot fully meet the design needs, and it is generally quadrilateral and octagonal, and the variety is relatively single; in addition, in 3D electromagnetic simulation, there is often no inductance model, and the planar spiral inductor needs to be designed by itself

Method used

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  • Side-length-gradual-change polygonal planar spiral inductor and generating method thereof
  • Side-length-gradual-change polygonal planar spiral inductor and generating method thereof
  • Side-length-gradual-change polygonal planar spiral inductor and generating method thereof

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Embodiment 1

[0061] Such as Figure 4 As shown, according to the present invention, an octagonal planar spiral inductor with W=10 μm and S=10 μm is generated, and n=8. Let the initial wire length of the model be lo=50μm, and the inductance coil is 2 turns. It can be known from formula (8) that δ=2.07μm. The line width W=10 μm, the coil spacing S=10 μm; the initial wire length lo=50 μm, the length difference between two adjacent wires δ=2.07 μm, and the end wire length is 83.12 μm. The initial wire length and the end wire length are modified to meet the inductor port location in the layout design. In this implementation case, modify the length of the initial wire to 34 μm, and modify the length of the end wire to 48 μm.

[0062] In summary, after setting the number of polygon sides n, wire width W, and coil spacing S in the present invention, according to the calculated length difference δ of two adjacent wires, in the process of generating inductance, the two adjacent wires The include...

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Abstract

The invention relates to a side-length-gradual-change polygonal planar spiral inductor. The lengths of all circles of wires of the inductor are gradually increased from inner circle to outer circle, and the differential value delta between the lengths of every two adjacent wires is a fixed value; the inner included angles theta between every two adjacent wires are equal; the distances S between all the circles of wires are equal; the inductor is generated based on a regular polygon, the number of sides of the regular polygon is n, and n is larger than or equal to three. The invention further discloses a generating method of the side-length-gradual-change polygonal planar spiral inductor. The number of the sides of the polygon is set to be n, the width of the wires is set to be W, and the distance between the circles of wires is set to be S. The inner included angle theta between every two adjacent wires can be kept unchanged in the process of generating the inductor according to the differential value delta between the lengths of every two adjacent wires, and on the basis of the length of an initial wire, the length of the wire is increased by delta every time one wire is added. Parameter setting is easy, and therefore it can be ensured that the equal-interval polygonal planar spiral inductor with the distance S value of all the circles as a fixed value is generated. The generating method is applied to side-length-gradual-change spiral inductors based on any polygon.

Description

technical field [0001] The invention relates to the technical field of integrated circuit device manufacturing, in particular to a polygonal planar spiral inductor with gradually changing side lengths and a generating method thereof. Background technique [0002] Inductors are one of the basic components in integrated circuits. Due to integration requirements and process limitations, inductors in integrated circuits are usually designed as planar spiral structures. Planar spiral inductors are fabricated on the same substrate as IC chips, such as silicon CMOS chips and gallium arsenide MMIC chips, through back-end processes and integrated circuits. They can also be made into embedded devices on low-loss substrates to form functional substrates. At the bottom, further system packaging, such as integrated passive device technology (IPD) technology. The planar spiral inductor has two ports, adopts vertical transition and insulating layer isolation technology, and the two ports ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/522H01L27/02H01L21/02H01L21/768
Inventor 刘勇曹锐张德智李庄
Owner CHINA ELECTRONIC TECH GRP CORP NO 38 RES INST