Optimization processing method for preparation of SERS substrate based on FIB direct-writing processing

Abstract

The invention relates to an optimization processing method for preparation of an SERS substrate based on FIB direct-writing processing. A focused ion beam (FIB)- electron beam two-beam system capable of carrying out electron beam scanning (SEM) and focused ion beam (FIB) processing is utilized. The method comprises the following steps: arranging a substrate to be processed in a two-beam system sample room and carrying out shape observation through an electron beam imaging system; preserving a certain processing width, and carrying out ion etching processing on the substrate by utilizing the focused ion beam (FIB) according to a target graph; utilizing the electron beams or the electron beam scanning imaging system to observe the processing process and result in real time; taking the sample out of the sample room and putting coating equipment in; and adjusting parameters with the ion beam processing structure and size being combined and vapor plating a precious metal film on the surface of the processing sample precisely, and taking the sample plated with the film as the surface enhanced Raman scattering (SERS) base. According to the method in the invention, the sensitivity and stability of the SERS base can be substantially improved.

Description

technical field [0001] The invention relates to a micro-nano processing method, more specifically, a micro-nano processing method for preparing SERS substrates based on focused ion beam and coating technology, which can be used for single-molecule detection, biological science sensing, and chemical analysis detection , micro-nano manufacturing, archaeological analysis, spectroscopy and other fields. Background technique [0002] With the discovery and principle research of localized surface plasmon resonance, the SERS active substrate based on LSPR technology has been rapidly developed and developed. The physical parameters of the micro-nano structure on the surface of the substrate, such as material, size, and shape, have become the core issues of processing and research. , and more and more methods have been used to prepare active SERS substrates. However, obtaining a SERS substrate with both high sensitivity and high stability is still a barrier to the widespread applica...

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Problems solved by technology

However, the texture of the thin noble metal layer evaporated on the substrate is softer than the substrate itself, and because the ion beam has a certain beam spot size, it will have a broadening effect during processing, which affects its processing accuracy, so the ion beam is directly deposited on the surface of the noble metal. Etching is difficult to maintain the characteristics and stability of the processed structure, and it is difficult to obtain a fine structure with a gap of less than 20nm

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